Fujikin Inc.

Other

Tokyo Electron Limited

Tadahiro Ohmi

Hitachi, Ltd.

Yoshikazu Tanabe

Nobukazu Ikeda

Koji Kawada

Hiroshi Morokoshi

Keiji Hirao

Yukio Minami

Akihiro Morimoto

Takahisa Nitta

Michio Yamaji

Kouji Kawada

Katunori Komehana

Teruo Honiden

Takashi Hirose

Touru Hirai

Kouji Nishino

Ryousuke Dohi

Kazuhiko Sugiyama

Satoshi Kagatsume

Toshirou Nariai

Masaharu Taguchi

Tsutomu Shinohara

Osamu Nakamura

Kazuhiro Yoshikawa

Atsushi Matsumoto

Jun Hirose

Hiroshi Koizumi

Eiji Ideta

Tomio Uno

Ryosuke Dohi

Hiroyuki Fukuda

Hideki Nagaoka

Toyomi Uenoyama

Koji Nishino

Kenji Tubota

Katsunori Yonehana

Kazuo Fukazawa

Tetsuya Kojima

Toshihide Yoshida

Mutsunori Koyomogi

Masahiko Nakazawa

Yuji Kawano

Masayuki Hatano

Yasuyuki Shirai

Tsuyoshi Tanikawa

Atsushi Hidaka

Shigeru Itoi

Masafumi Kitano

Takatoshi Nakatani

Ichiro Tokuda

Kunihiko Daido

Shigeaki Tanaka

Hisashi Tanaka

Naoya Masuda

Masahiko Sogao

Michio Kuramochi

Tetu Kagazume

Shuhei Ogawa

Keisuke Nakatsuji

Toshiro Nariai

Toshio Nariai

Takumi Fujita

Kouji Kawata

Tsutomu Tanigawa

Michihiro Kashiwa

Manohar L Shrestha

Provided is a closing plug capable of easily closing an open end of a flow passage without concern of scale. The closing plug includes: a gasket configured to come into contact with an annular projection formed in a step portion inside the open end of the flow passage of a flow passage block; a columnar pressing member formed by cutting out an inner side of a pressing surface so as to press a peripheral edge portion of the gasket; and a closing plug screw configured to be screwed into a female screw formed in an inner peripheral surface on an open end side from the step portion and press the pressing member toward the gasket by movement caused by screwing.

Closing plug and fluid control device

A fluid supply device and a fluid supply method capable of stably supplying a supercritical fluid includes a fluid supply device for supplying a fluid in a liquid state before being changed to a supercritical fluid toward a processing chamber. The fluid supply device comprises a condenser that condenses and liquefies a fluid in a gas state, a tank that stores the fluid condensed and liquefied by the condenser, a pump that pressure-feeds the liquefied fluid stored in the tank toward the processing chamber, and a heating means provided to a flow path communicating with a discharge side of the pump and for partially changing the liquid in the flow path to a supercritical fluid.

Fluid supply device and fluid supply method

In order to appropriately control temperatures of fluid heating sections that are maintained at different temperatures, the fluid control device () comprises a plurality of fluid heating sections () connected to each other and each having a flow path or a fluid accommodating portion inside, heaters () configured to heat each of the plurality of fluid heating sections to different temperatures, and heat insulating members (') disposed between adjacent fluid heating sections.

Fluid control device

A fluid supply device includes a condenser, a tank that stores the fluid, a pump that pressure-feeds the fluid toward a processing chamber, a main pipe connecting the tank and the pump and transferring the liquid stored in the tank to the pump using a weight of the liquid, and a discharging pipe that is connected to the main pipe at a lowest position of the main pipe at one end, is opened to the atmosphere at the other end, and vaporizes and discharges the liquid in the tank and the main pipe to the outside. The discharging pipe is formed so that, after the liquid in the tank and the main pipe is fully discharged, a liquid pool that separates a space on the atmosphere side and a space on the main pipe side of the discharging pipe is temporarily produced in the discharging pipe.

Fluid supply device and liquid discharge method of this device

The method for parallel operation of moisture generating reactors according to the present invention operates so that an orifice, provided with an orifice hole having a predetermined opening diameter, is disposed on a mixed-gas inlet side of each of a plurality of moisture generating reactors connected in parallel with each other, and mixed gas G consisting of hydrogen and oxygen is supplied from a mixer to each of the moisture generating reactors through each orifice, and the flows of moisture generated by the moisture generating reactors are combined, and the resulting combined moisture is supplied to an apparatus that uses high-purity water. Thus, a need to increase the amount of high-purity water supply is met by allowing a plurality of moisture generating reactors to perform a parallel water generating operation by branching off a mixed gas consisting of Hand Oby using a simple orifice construction.

Method for parallel operation of reactors that generate moisture

A reactor for generating moisture, with which hydrogen and oxygen fed into the reactor contact with a platinum coating catalyst layer to activate reactivity so that hydrogen and oxygen react under conditions of non-combustion, wherein the reactor includes a cooler comprising a heat dissipation body substrate in which a heater insertion hole is made in the center to fix to the outer surface of the reactor structural component on the outlet side and a cooler on the outlet side made up of a plural number of heat dissipation bodies installed vertically in parallel on the part excluding the area where the afore-mentioned heater insertion hole of the heat dissipation body substrate exists, and a part of the heater to heat the reactor is inserted in the heater insertion hole so as to fix to the outer surface of the reactor structural component on the outlet side.

Reactor for generating moisture and moisture generating and feeding apparatus for which the reactor is employed

The present invention provides a vacuum thermal insulating valve that may be used at high temperature in gas supply systems or gas exhaust systems, and also may be made substantially small and compact in size owing to its excellent thermal insulating performance. With a vacuum thermal insulating valve comprising a valve equipped with a valve body and an actuator, and a vacuum thermal insulating box that houses the valve, the afore-mentioned vacuum thermal insulating box S is formed by a square-shaped lower vacuum jacket Shaving a cylinder-shaped vacuum thermal insulating pipe receiving part J on a side and with its upper face made open, and the square-shaped upper vacuum jackets S, which is hermetically fitted to the lower vacuum jacket Sand with its lower face made open.

Vacuum thermal insulating valve

A barrier film which has uniform thickness and excellent adhesiveness to the base material and superbly functions to protect a platinum film can be formed on the inner wall surface of a moisture-generating reactor at ease and at a low cost. The moisture-generating reactor in which hydrogen and oxygen are reacted to generate moisture without high temperature combustion is made of an alloy containing aluminum. A principally aluminum oxide (AlO)-composed barrier film is formed by applying an aluminum selective oxidation treatment on the inner wall surface of the moisture-generating reactor, and thereafter a platinum film is stacked on and stuck to the barrier film so that a platinum coating catalyst layer is formed.

Process of forming platinum coating catalyst layer in moisture-generating reactor

A safe, reduced pressure apparatus for generating water vapor from hydrogen and oxygen and feeding high purity moisture to processes such as semiconductor production. The apparatus eliminates the possibility of the gas igniting by maintaining the internal pressure of the catalytic reactor for generating moisture at a high level while supplying moisture gas from the reactor under reduced pressure. A heat dissipation reactor improvement substantially increases moisture generation without being an enlargement in size by efficient cooling of the reactor alumite-treated fins.

Apparatus and reactor for generating and feeding high purity moisture

It is an object of the present invention to provide a rotation type silicon wafer cleaning device to further raise the stability of a silicon wafer by providing a better hydrogen termination on the silicon wafer after completion of chemical and pure water cleaning treatments. According to the present invention, a rotation type silicon wafer cleaning device has a silicon wafer support/rotation driving mechanism inside the case body for cleaning the silicon wafer at the post chemical cleaning with pure water, drying and hydrogen termination treatments on the outer surface of a silicon wafer is performed by means of installing a silicon wafer drying device comprising a gas supply panel attached to a case body to supply a mixed gas of the hydrogen gas and inactive gas containing a hydrogen gas of more than 0.05%, a mixed gas supply pipe coupled to a gas mixer of the afore-mentioned gas supply panel at one end, a mixed gas heating device to heat the mixed gas in the afore-mentioned gas supply pipe, and a hydrogen radical formation apparatus equipped with a platinum coating film to form hydrogen radical at the gas contacting part where to a high temperature gas heated with the afore-mentioned mixed gas heating device touches, thus to gush out the mixed gas containing hydrogen radical formed with the afore-mentioned radical formation apparatus onto the rotating silicon wafer after cleaning is completed.

Rotary silicon wafer cleaning apparatus

A reactor for generating moisture wherein ignition of hydrogen gas, backfire to the gas supply source side, the peeling off of the platinum coat catalyst layer inside are prevented more completely to further increase the safety of the reactor for generating moisture and wherein the dead space in the interior space is reduced to further reduce the size of the reactor shell. The reactor comprises: a reactor shell A with an interior space formed with a reactor structural component on the inlet side and a reactor structural component on the outlet side opposed to and united with each other by welding, the reactor structural componenton the inlet side provided with a gas feed portand the reactor structural componenton the outlet side provided with a moisture gas take-out port; a reflector on the inlet side facing the gas feed port in the interior space of the reactor; a reflector on the outlet side facing the moisture gas take-out port in the interior space; and a platinum coat catalyst layerformed on the inside wall of the reactor structural component on the outlet side, wherein hydrogen and oxygen fed into the interior space of the reactor through the gas feed port are brought into contact with the platinum coatto activate the reactivity, thereby reacting hydrogen and oxygen into water in a non-combustion state.

Reactor for generating moisture

A reactor for generating moisture wherein ignition of hydrogen gas, backfire to the gas supply source side, and the peeling off of the platinum coat catalyst layer inside are all prevented more completely to further increase the safety of the reactor for generating moisture, and wherein the dead space in the interior space is reduced to further reduce the size of the reactor shell. The reactor has a reactor shell A with an interior space; a reflector on an inlet side facing a gas feed port in the interior space of the reactor; a reflector on an outlet side facing a moisture gas take-out port in the interior space; and a platinum coat catalyst layer 8 formed on an inside wall of a reactor structural component on the outlet side. Hydrogen and oxygen fed into the interior space of the reactor react without combustion.

A fluid supply apparatus with a plurality of flow lines branching out from one pressure regulator with the flow lines arranged in parallel and constructed so that opening or closing one flow passage will have no transient effect on the steady flow of the other flow passages. Each flow passage is provided with a time delay-type mass flow controller MFC so that when one closed fluid passage is opened, the mass flow controller on that flow passage reaches a set flow rate Qs in a specific delay time &#x394;t from the starting point. The invention includes a method and an apparatus in which a plurality of gas types can be controlled in flow rate with high precision by one pressure-type flow control system.

Parallel divided flow-type fluid supply apparatus, and fluid-switchable pressure-type flow control method and fluid-switchable pressure-type flow control system for the same fluid supply apparatus

Growing community of inventors

Osaka, Japan

Yukio Minami