Jsr Corporation

Satake Corporation

Janome Sewing Machine Company Limited

Satake Engineering Co., Ltd.

Techno Polymer Company Limited

Jm Energy Corporation

Kabushiki Kaisha Fuji Seisakusho

Yukio Hosaka

Satoru Satake

Kou Hasegawa

Toshihiko Satake

Hideharu Maruyama

Hiroshi Shiho

Nobuhiko Nakamura

Osamu Ishikawa

Nobuo Kawahashi

Hozumi Satou

Akiko Nakata

Takeshi Kongo

Takeshi Imai

Ryo Tanaka

Takahiro Okamoto

Eiichi Shomura

Kenji Inoue

Takashi Kurata

Fujio Sakurai

Rikimaru Kuwabara

Shinya Fushida

Akira Eto

Takaharu Kameoka

Kouji Senoo

Hideaki Takenoya

Yoshitaka Takahashi

Eiji Murakami

Akira Orii

Yoshikazu Ebata

Tsuyoshi Watanabe

Takahiro Shimizu

Yukio Onogi

Satoshi Shimobaba

Shinji Saito

Masanori Matsuda

Tsutomu Saito

Hideki Nishimura

Nobuyuki Miyaki

Hiroyuki Tano

Yuuichi Eriyama

Motoki Okaniwa

Tsutomu Takagi

Kenji Kojima

Masahiro Yamamoto

Takafumi Shimizu

Hayato Takada

Kazuhiko Koike

Yuuji Matsumoto

Yasuo Fukuyo

Kiyonori Nakaoka

Nobuharu Yagishita

Shigeru Tomizawa

Hideo Yamashita

Kotaro Kubo

Kang Ko Chung

A microorganism concentrator includes a water storage part that stores water sample therein and a filter that partitions the water storage part into a supply side and a drain side for the water sample. The microorganism concentrator concentrates microorganisms that are too large to pass through the filter on the supply side by moving the water sample on the supply side to the drain side of the water storage part. In the microorganism concentrator, the filter is arranged in such a way that no vertically downward force is applied to a surface of the filter on the supply side.

Microorganism concentrator

The present invention relates to an electrode material, an electrode, an electrical storage device and a lithium-ion capacitor, and the electrode material includes a carbon material and reduces its weight at a temperature not more than 650&#xb0; C. by 20% relative to the weight thereof before heating when thermogravimetric analysis is performed on the electrode material with a heating rate of 5&#xb0; C./min in an air flow at a rate of 100 ml/min.

Electrode material, electrode and electrical storage device

An examination apparatusfor microorganisms for measuring an amount of microorganisms in a sample solution, the apparatus including stirring and mixing meansfor stirring and mixing the sample solution into which a sample and a fluorescent staining reagent are added, in a sample containerformed of a material allowing light to pass through, an excitation light sourceincluding a light source that irradiates an irradiation target surface of the sample containerwith excitation light while the sample solution is being stirred by the stirring and mixing means, light receiving meansfor detecting light and converting the light resulting from a fluorescent emission caused by excitation light from the excitation light source, into an electric signal, and control meansfor detecting the number of emissions based on the electric signal from the light receiving meansand calculating the amount of the microorganisms contained in the sample in the sample containerbased on the number of emissions.

Method for examining microorganisms and examination apparatus for microorganisms

In one preferred mode, the operator selects by the touch panela pattern from the displayed patterns on the displayand starts the embroidery by operation of the start/stop switch. The CPUis checking the detection signal from the sensorand when the signal is on, the CPUkeeps the displayin operation. When the operator goes out from the sensor detectable area, the signal of the sensordisappears and the CPUgenerates the LED displayindicating the progress of the sewing. Since the operator can see the LED displayfrom the outside of the display visible area, the operator recognizes the conditions of the machine A.

Sewing machine

A method for examining microorganisms has a sampling preparation step including a fluorescence staining step of stirring and mixing certain amounts of a sample and a fluorescence staining reagent, a still standing step of leaving the solution after the fluorescence staining step to still stand for a certain time, and a dilution step of diluting the solution after the still standing step with a liquid that emits no fluorescence.

Method for examining microorganisms

The present invention relates to a production process for an electrode material, an electrode and an electric storage device, and the production process for an electrode material comprises a step of heating a polymer having a silicon-containing unit and a silicon-non-containing unit.

Production process for electrode material, electrode and electric storage device

A sewing machine includes a temporal memory that stores stitchwork data currently stitched, and a first CRC data converter unit that converts the stitchwork data into unique codes. A stitchwork status checking apparatus includes a temporal memory that stores stitchwork data, a second CRC data converter unit that converts the stitchwork data stored in the local temporal memory into unique codes, and a CRC data converter unit that compares the codes converted by the first CRC data converter unit with the codes converted by the second CRC data converter unit. The stitchwork data stored in the temporal memory of the stitchwork status checking apparatus is the stitchwork data currently stitched by the sewing machine and transferred via a wireless network.

Stitchwork status checking system, stitchwork status checking apparatus, stitchwork status checking method and stitchwork status checking program

An object of the present invention is to provide an embroidery cloth presser which prevents a needle thread from being sandwiched between the embroidery cloth presser and a cloth to allow an embroidery frame to move smoothly and which also prevents inappropriate draw-in of the needle thread, that is, prevents a cross-over thread of the needle thread resulting from long-distance movement of the embroidery frame from remaining on an embroidery surface. An embroidery cloth presser is installed on a presser bar of a sewing machine to press a cloth to be embroidered and which includes a projection provided on a bottom surface of the cloth presser which contacts the cloth around a needle and forming, between the cloth presser and the cloth, a gap through which a needle thread passes.

Embroidery cloth presser

An imprinter includes a printing base for mounting a card and a print paper to be imprinted on a predetermined area thereof, a carriage that is movable above the printing base, a roller includes a hard material and is provided as is housed within the carriage for transcribing the information represented as embossed on a card, a roller shaft for fixedly supporting the roller, bearings for rotatably supporting the roller shaft at a position of a predetermined height from the card mounting surface of the printing base, and an elastic mechanism provided between the bearings and the roller shaft, the elastic mechanism being radially deformed during an imprinting operation to cause the roller to radially move relative to the bearings so that the embossed information of the card may be transcribed onto the print paper.

Imprinter including an elastic member for elastically supporting the roller shaft

A stitchwork status checking apparatus includes a stitchwork data receiver unit that receives stitchwork data on a stitchwork pattern selected and currently stitched by a sewing machine, a converter unit that converts the received stitchwork data into a unique code, a status data receiver unit that receives a unique code converted based on the stitchwork data currently stitched by the sewing machine, and a code comparator unit that compares a code converted by the converter unit with a code received by the status data receiver unit. The stitchwork data receiver unit receives the stitchwork data through a transmission protocol that surely transmits data to a transmission destination. The status data receiver unit receives the code through a transmission protocol that transmits data to a transmission destination within a short time.

A chemical mechanical polishing pad includes a polishing layer, a recess being formed in a polishing surface of the polishing layer, the polishing layer including a surface layer that forms at least an inner side of the recess, and a ratio (D1/D2) of an average opening ratio D1(%) to an average opening ratio D2(%) being 0.01 to 0.5, the average opening ratio D1 being an average opening ratio of the inner side of the recess when the polishing layer has been immersed in water at 23&#xb0; C. for 1 hour, and the average opening ratio D2 being an average opening ratio of a cross section of the polishing layer that does not intersect the surface layer when the cross section has been immersed in water at 23&#xb0; C. for 1 hour.

Chemical-mechanical polishing pad and chemical-mechanical polishing method

An imprinter includes a printing base for mounting a card and a print paper to be imprinted on a predetermined area thereof, a carriage that is movable above the printing base, a roller shaft arranged at a position of a predetermined height from the card mounting surface of the printing base, a roller including an outer periphery of hard material a center boss that is in rotational engagement with the roller shaft and elastic members provided between the outer periphery and the center boss of the roller. The elastic members are radially deformed during imprinting operation to cause the outer periphery of the roller to radially move relative to the center axis of the roller shaft into a state of eccentric circle in vertical section, so that the embossed information of the card may be transcribed onto the print paper.

Imprinter including a roller with an elastic member being radially deformed during an imprinting operation

A composition for forming a chemical mechanical polishing pad having polishing characteristics such as a high polishing rate, an excellent planarity of the polished object, and less scratches of the polished object. The composition includes (A) a polyurethane having a carbon-carbon double bond on a side chain and (B) a cross-linking agent. The polyurethane (A) is preferably a thermoplastic polyurethane (A') obtained by mixing at least components (a11) to (a13) and component (a2) in a proportion satisfying the following conditions (1) and (2) and reacting them.

Composition for forming polishing layer of chemical mechanical polishing pad, chemical mechanical polishing pad and chemical mechanical polishing method

There is provided a method for producing a chemical mechanical polishing pad, the method comprising the steps of (1) producing a sheet-shaped polymer molded article and (2) irradiating the sheet-shaped polymer molded article with an electron beam within an irradiation dose of 10 to 400 kGy. A chemical mechanical polishing pad produced by the above method has advantages that it is excellent in removal rate and scratches and in-plane uniformity on a polished surface and that it shows a stable removal rate even when polishing a number of objects to be polished successively.

Method for producing chemical mechanical polishing pad

The present invention relates to a method of manufacturing a chemical mechanical polishing pad which provides a chemical mechanical polishing pad which fully suppresses the occurrence of a scratch on the polished surface and has an excellent polishing rate. The method comprising either one of a group of steps (A) and a group of steps (B), the group of steps (A) including

Method of manufacturing chemical mechanical polishing pad

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Tokyo, Japan

Yukio Hosaka