Tokyo Electron Limited

Yukio Fukuda

Tadahiro Ishizaka

Atsushi Gomi

Junichi Arami

Yasuhiko Kojima

Kohei Kawamura

Takashi Shigeoka

Yasuhiro Oshima

Naoki Yoshii

A processing apparatus is disclosed which is capable of switching supplies of a raw material gas and a reducing gas alternately, while continuously forming a plasma of the reducing gas. An excitation device () excites a reducing gas supplied thereinto, and the excited reducing gas is supplied into a process chamber (). A switching mechanism () is arranged between the excitation device () and the process chamber (), and a bypass line () is connected to the switching mechanism (). The switching mechanism () switches the flow of the excited reducing gas from the excitation device () between the process chamber () and the bypass line ().

Gas switching mechanism for plasma processing apparatus

Growing community of inventors

Nakakoma-gun, Japan

Yukio Fukuda