Panasonic Intellectual Property Management Co., Ltd.

Yukiko Kitahara

Masanori Minamio

Akira Isomi

Genichiro Matsuda

Daisuke Tabata

Gaku Miyake

Yoshio Yamada

Hiromi Matsumoto

A liquid processing apparatus includes a processing tank, a first electrode, an insulator, a liquid introduction port, a discharge portion, a second electrode, an opening portion, and a power supply. The first electrode is disposed at the first end of the processing tank. The insulator covers at least a part of a side surface of the first electrode disposed to protrude from an inner wall of the first end of the processing tank into the processing tank. The liquid introduction port causes a liquid to swirl by introducing the liquid in a tangential direction of the processing tank and generates a gas phase in a swirling flow of the liquid. An outer diameter of the insulator is smaller than an outer diameter of a gas-phase generating space where the gas phase is generated in the processing tank.

Liquid processing apparatus

A sanitization mist shower apparatus includes a water tank that stores water, a plasma generator that causes a plasma discharge in water inside the water tank and generates reformed water, an air blower that blows pressurized air, and a mist nozzle that spouts fine mist obtained by mixing the reformed water supplied from the water tank and the pressurized air supplied from the air blower. A liquid pressure of the reformed water supplied to the mist nozzle and air pressure of the pressurized air are substantially the same as each other.

Sanitization mist shower apparatus

Growing community of inventors

Osaka, Japan

Yukiko Kitahara