Nippon Soda Co., Ltd.

Yukikazu Nobuhara

Hitoshi Matsumoto

Hiroo Muramoto

Shinichi Kimizuka

Masanori Maruno

Jun Yoshida

Kenya Yamashita

Nakamura Mitsuhiro

Asami Kobayashi

Eiichiro Kobayashi

A photosensitive resin composition for flexographic printing having excellent resistance to an ink comprising an organic solvent and an emulsion ink used in flexographic printing, for example, a UV-curable ink or an ink using a vegetable oil or light naphtha and having excellent suitability for printing applications such as image reproducibility and print durability. The photosensitive resin composition for flexographic printing includes, at least, (a) one or more thermoplastic elastomers, (b) an acrylic-terminated liquid polybutadiene containing 1,2-bonds in an amount of 80% or more, (c) a photopolymerizable unsaturated monomer having at least one or more ethylenically unsaturated groups, and (d) a photopolymerization initiator.

Photosensitive resin composition for flexographic printing having excellent solvent resistance

An ESCAP type polymer which has a controlled structure wherein the groups protecting phenolic hydroxyl groups have been selectively or partly eliminated or decomposed with an acid and no carboxylic acid residues are contained and which is a narrow-disperse polymer and is suitable for use as a material for a chemical amplification type resist for excimer lasers which has excellent resolution. The process is characterized by subjecting either an alkenylphenol in which the phenolic hydroxyl group has been protected or the alkenylphenol and a vinylaromatic compound to anionic polymerization together with a (meth)acrylic ester to give a block copolymer and eliminating only a given proportion of the groups protecting the phenolic hydroxyl groups from the block copolymer with an acid reagent. Thus, an alkenylphenol copolymer is synthesized which has a ratio of the weight-average molecular weight (Mw) to the number-average molecular weight (Mn), (Mw/Mn), of 1.00 to 1.50 and has no carboxylic acid residues.

Alkenylphenol copolymer and process for producing the same

A novel star block copolymer which can be made to have a high molecular weight and gives a solution having a lower viscosity than solutions of linear polymers having the same molecular weight as the copolymer and which is expected to be used as a resist material; and a process for producing the copolymer. The star block copolymer having alkenylphenol skeletons is obtained by homopolymerizing by living anion polymerization an alkenylphenol compound in which the hydroxyl group of the phenol moiety has been protected by a saturated aliphatic protective group or copolymerizing the alkenylphenol compound with a vinylaromatic compound by living anion polymerization, subsequently copolymerizing the resultant polymer using a polyfunctional coupling agent such as divinylbenzene to obtain a star block copolymer, and eliminating the saturated aliphatic protective groups with an acid reagent.

Star block copolymer

A process for producing a monodisperse polymer which has a number-average molecular weight from 1,000 to 100,000 and a molecular weight distribution Mw (weight-average molecular weight)/Mn (number-average molecular weight)&equals;1.00 through 1.50 is disclosed. This process comprises: homopolymerizing or random copolymerizing an anionic polymerizable compound by living anionic polymerization using an organic alkali metal and/or an alkali metal as a polymerization initiator, wherein a target molecular weight is obtained by adding the compound divided into multiple steps.

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Ichihara, Japan

Yukikazu Nobuhara