Hitachi, Ltd.

Yukihisa Tsukada

Masahide Suenaga

Hiroshi Yamamoto

Noboru Shimizu

Tooru Takeura

Masahiro Kitada

Shinji Narishige

Tetsuo Kobayashi

Kazuhiro Momata

Shinichi Hara

Kousaku Chida

The magnetic head according to the present invention has a ferrite substrate and closure. The ferrite substrate has formed therein a first recess in which a conductive coil is to be deposited, while the ferrite closure has formed therein a second recess enclosing a portion of the conductive coil that is contributed to at least signal transducing. The end of the second recess is disposed in a position related with the depth of the tranducing gap. Since the first recess in which the conductive coil is deposited has no influence on the magnetic transducing efficiency, it can be much freely formed by photolithography or reactive ion etching. Also since the second recess having an influence on the magnetic transducing efficiency can be formed by precision machining, no advanced process control is needed.

Magnetic head closure having ferrite substrate and closure and

A first magnetic layer is formed upon a non-magnetic substrate, a gap layer is formed upon the first magnetic layer, a conductor coil covered with an insulation layer is formed upon the gap layer, a second magnetic layer is formed upon the gap layer and the insulation layer, a magnetic gap being formed between the first and second magnetic layers at a front portion facing a recording medium, and the second magnetic layer being connected to the first magnetic layer at a back portion. After forming a mask made of metal oxide upon the second magnetic layer, the second magnetic layer, the gap layer, and the first magnetic layer are formed into a predetermined shape respectively at the tip portion by dry etching. Thus, a high performance thin-film magnetic head having the same widths for the first and second magnetic layers is obtained.

Method of manufacturing a thin-film magnetic head

A method of forming a multilayer thin film is disclosed in which a second thin conductive film is deposited on a first thin conductive film uninterruptedly after the first thin film has been deposited on a substrate, the first and second films thus formed are processed so as to form a predetermined pattern, the surface of the second thin film is cleaned by ion etching and a third thin conductive film is deposited on the whole surface of the substrate, and then the second and third thin films are processed so as to have a pattern different from the above-mentioned predetermined pattern. In the case where two thin conductive films different in material and pattern from each other are piled on a substrate, the above method can form a perfect interconnection between the two films and can make very small the contact resistance between the two films. Accordingly, the method is fit to form, for example, a barber pole type magnetoresistive element.

Method of forming a multilayer thin film

In forming a magnetic film pattern of permalloy by photoetching, the permalloy magnetic film formed on a substrate is etched in an etching solution containing ferric chloride, hydrochloric acid and phosphoric acid, thereby gradually reducing the thickness of the film pattern at the side edges in a tapered state. The permalloy magnetic film can be easily taper-etched without any deterioration of magnetic properties of permalloy magnetic film and substrate surface, but with a greatly improved yield of magnetic film head production and a greatly improved reliability.

Process for forming magnetic film pattern

Electrodes for a magnetoresistive sensor can be formed easily by a method wherein a double-layer structure of Mo and Al on a film of a magnetoresistive material such as permalloy is formed to have a predetermined pattern, firstly by exposing an Al layer to a chemical etching solution or subjecting the Al layer to the ion-milling treatment to give said Al layer said pattern and then subjecting a Mo layer to the plasma etching or reactive sputter etching treatment to give said Mo layer said pattern.

Growing community of inventors

Odawara, Japan

Yukihisa Tsukada