Bridgestone Corporation

Other

Bridgestone Sports Co., Ltd.

Danmarks Tekniske Universitet

Technical University of Denmark

Force Technology Corp.

Hideomi Koinuma

Yukihiro Kusano

Masato Yoshikawa

Kazuo Naito

Satiko Okazaki

Yoshinori Iwabuchi

Masuhiro Kogoma

Mitsuhiro Nishida

Yukio Fukuura

Setsuo Akiyama

Taichi Kobayashi

Nobuko Kato

Shingo Ohno

Itsuo Tanuma

Yasuhiro Morimura

Toshio Honda

Hidefumi Kotsubo

Hideo Sugiyama

Niels Krebs

Hideyuki Niwa

Shingo Oono

Yoshio Nohara

Tomonobu Hata

Alexander Bardenshtein

Fumihiro Matsuyama

Kazuo Naitoh

Henrik Bindslev

EngKean Sim

Henrik Junge Mortensen

Masahiro Kogoma

Tomoko Inagaki

Mahito Fuji

The invention relates to an apparatus for treating a surface with a at least one gliding arc source comprising at least one gas flow controlling unit (); and a set of electrodes (); wherein the at least one gas flow controlling unit () and the set of electrodes () are controlled to provide a plasma comprising a gas temperature at the set of electrodes () above approximately 2000 K. In this way, an optimal or substantially optimal plasma for treating surfaces of samples is achieved.

Apparatus and a method and a system for treating a surface with at least one gliding arc source

This invention relates to a plasma surface modification process (and a corresponding a system) of a solid object () comprising creating plasma () by a plasma source (), application of the plasma () to at least a part of a surface () of the solid object (), generating ultrasonic high intensity and high power acoustic waves () by at least one ultrasonic high intensity and high power acoustic wave generator (), wherein the ultrasonic acoustic waves are directed to propagate towards said surface () of the object () so that a laminar boundary layer () of a gas or a mixture of gases () flow in contact with said solid object () is thinned or destructed for at least a part of said surface (). In this way, the plasma can more efficiently access and influence the surface of the solid object to be treated by the plasma, which speeds the process time up significantly.

Enhancing plasma surface modification using high intensity and high power ultrasonic acoustic waves

A transparent conductive film comprising a polymer film and a transparent conductive layer provided thereon, especially a transparent conductive film improved in durability and mechanical and electrical properties, a process for the preparation thereof, and a touch panel provided with the transparent conductive film, as well as transparent conductive plate and the process for the preparation thereof. The transparent conductive film comprising a polymer film, an undercoat layer and a transparent conductive layer which are superposed in this order, and the undercoat layer contains a compound having at least one selected from an amino group and a phosphoric acid group.

Transparent electroconductive film, method for manufacture thereof, and touch panel

A method of producing an anti-reflection film includes forming a first layer on a transparent substrate, forming a second layer on the first layer, and forming the third layer on the second layer. When an optical admittance Y at a surface of the second layer is represented by, where i is the imaginary number unit,thicknesses and reflective indexes of the substrate, first layer, second layer, and third layer are selected so that x and y satisfy the following formula,0.9{()/2&#x2212;()/2&#x3c;1.1{()/2}where n is a refractive index of the third layer and nis a refractive index of an outer region at an outside of the anti-reflection film.

Method of producing anti-reflection film

A touch panel includes a transparent electro-conductive film. The transparent electro-conductive film comprises a primary layer formed on a polymer film, and a transparent electro-conductive thin film or a multi-lamination film composed of at least one metal-compound layer and at least one electro-conductive-metal layer is formed on the primary layer. The primary layer is made of silicon compound. The primary layer is formed by sputtering, using a target having a density of 2.9 g/cmor more.

Method of manufacturing transparent electro-conductive film

Touch panel

A transparent conductive film has a polymer filmand a transparent conductive layerformed on the polymer film. The transparent conductive layer includes indium oxide, a zinc oxide system and a tin oxide system. A covering layer, made of material different from that of the transparent conductive layer, is formed on the transparent conductive layer. A touch panel is provided with the transparent conductive film as its upper electrodeA or lower electrode. The surface of the transparent conductive layer is covered with the covering layer, so that physical or chemical stresses generated during the input to the touch panel do not affect transparent conductive layer directly, thus preventing damages and delamination of the transparent conductive layer. Furthermore, the covering layer formed on the transparent conductive layer improves the strength of the transparent conductive film, thereby enhancing a resistance to wear.

Transparent conductive film and touch panel

A film deposition apparatus equipped with a vacuum chamber, comprising a pair of rollers for vertically traveling a continuous sheet as a substrate, and a pair of sputtering cathodes for continuously depositing the film on the surfaces of the sheet in the vacuum chamber. The cathodes are vertically arranged and horizontally faced each other. The sheet is traveled between a pair of the cathodes. The apparatus and the film deposition process using it make it possible to deposit a film even on surfaces of a flexible sheet without causing problems such as defective film deposition or abnormal discharge, while ensuring stable, continuous, long-term operation.

Apparatus and process for film deposition

A provided transparent electroconductive film has a polymer film and a transparent electroconductive layer deposited on the polymer film, which has no problem of damages and removal of the transparent electroconductive layer. The transparent electroconductive film has a polymer film and a transparent electroconductive layer deposited on the polymer film . A protective layer made of material different from that of the transparent electroconductive layer is formed on the transparent electroconductive layer . A touch panel has the transparent electroconductive film as an upper electrode A or a lower electrode.

Transparent electroconductive film and touch panel

A transparent electroconductive film has a polymer film, a primary layer formed on the polymer film, and a transparent electroconductive thin film or a multi-lamination film composed of at least one metal-compound layer and at least one electroconductive-metal layer, formed on the primary layer. The primary layer is made of silicon compound. The primary layer is formed by sputtering, using a target having a density of 2.9 g/cm or more.

Transparent electroconductive film

A thin film of a metal compound such as metal oxide, nitride and carbide is formed on a substrate by sputtering a target in vacuum in the presence of an inert gas and a reactive gas. From a curve of an input power supplied from a DC supply to the target versus an input voltage between the target and the substrate, a transition point of input power at which an abrupt change of the input voltage occurs is determined. The input power during sputtering is controlled using the transition point as a reference, thereby controlling the composition or physical properties of the thin film. When a cobalt oxide thin film is formed on a substrate in this way, rubber can be vulcanized thereto to form a firm bond.

Formation of metal compound thin film and preparation of rubber composite material

A process for surface treatment of a vulcanized rubber is disclosed, said process comprising: generating a nonequilibrium low-temperature plasma under atmospheric pressure between a cathode and an insulating dielectric which is interposed between the cathode and an anode while introducing a gas for generating plasma to a plasma-generating region between the cathode and the insulating dielectric, placing the vulcanized rubber in air and outside the plasma-generating region so that a surface of the vulcanized rubber faces the plasma-generating region, and directing the gas from the plasma-generating region toward the surface of the vulcanized rubber so that the gas impinges against the rubber surface for effecting surface treatment.

Process for surface treatment of vulcanized rubber and process for

A method of cleaning a vulcanizing mold including the steps of providing, independently from a vacuum processing bath, a furnace for generating a plasma flow mainly containing neutral active species by a microwave discharge applied for a reactive gas; introducing the plasma flow in the processing bath and jetting it to the entire residue adhering surface of the mold positioned in the processing bath; and ashing residues by the jetted plasma gas. With this method, uniform ashing can be performed for residues adhering on the surface of a vulcanizing mold, without any adverse effect exerted on the mold.

Plasma and heating method of cleaning vulcanizing mold for ashing residue

Only an outer surface of an unvulcanized rubber sheet is preliminarily crosslinked by irradiating an infrared ray or a far infrared ray to the unvulcanized rubber sheet prior to subsequent final vulcanization, whereby the occurrence of rubber spew and rubber flash is considerably suppressed at the vulcanization step.

Process and apparatus for surface treatment of unvulcanized rubber sheet

A length of sheet material is continuously surface treated, typically modified or coated, by continuously feeding helium gas or a helium gas mixture into a treating chamber while a plasma region is created in the gas under atmospheric pressure, continuously moving a length of sheet material into and out of the chamber through entrance and exit ports to pass through the plasma region, thereby continuously subjecting the sheet at either surface to plasma discharge treatment. The entrance and exit ports are sealed in a less gas tight manner to allow leakage of the helium gas or gas mixture.

Growing community of inventors

Roskilde, Denmark

Yukihiro Kusano