Mitsubishi Denki Kabushiki Kaisha

Yukihiko Wada

Tetsuya Takami

Kazuyoshi Kojima

Koichi A Ono

Akihiko Furukawa

Akihiro Suzuki

Toshiyuki Oishi

Hitoshi Wakata

Kenyu Haruta

Kenichi Kuroda

Yoshio Saito

Tomohiro Sasagawa

Tsuyoshi Horikawa

Takaaki Kawahara

Taisuke Furukawa

Naohiko Fujino

Noboru Mikami

Mutsumi Tsuda

Hideki Yabe

Junji Tanimura

Kazuo Kuramoto

Kouji Kise

Keisuke Nanba

Akimasa Yuki

Tetsuo Makita

Hiroshi Kuroki

Tetsuo Ogama

Yasuji Matsui

A thin film forming apparatus using laser includes a chamber (1), a target (5) placed therein, a laser light source (10) for emitting laser beam to target (5), and a substrate holder (3). When target (5) is irradiated with laser beam (16), a plume (15) is generated, and materials included in plume (15) are deposited on the surface of a substrate (2) held by substrate holder (3). The laser beam emitted from laser light source (10) has its cross section shaped to a desired shape when passed through a shielding plate (4804), for example, so that the surface of the target (5) is irradiated with the beam having uniform light intensity distribution. Therefore, a plume (15) having uniform density distribution of active particles is generated, and therefore a thin film of high quality can be formed over a wide area with uniform film quality, without damaging the substrate.

Thin film forming apparatus using laser

Growing community of inventors

Hyogo, Japan

Yukihiko Wada