Other

Yukihiko Takeuchi

Taketo Maruyama

Hisaki Abe

Tetsuo Aoyama

Masahiro Nohara

Taimi Oketani

Hijiri Nakahara

Tetsuya Karita

Ryou Hashimoto

Photoresist stripping composition and process for stripping resist

A resist film removing composition used in the manufacture of a thin film circuit element having an organic insulation film which comprises 50 to 70% by weight of an alkanolamine having 3 or more carbon atoms, 20 to 30% by weight of a water-miscible solvent and 10 to 20% by weight of water. The resist film removing composition can easily remove a resist film remaining after etching, without swelling the organic insulation film.

Resist film removing composition and method for manufacturing thin film circuit element using the composition

A photoresist stripping composition comprises (1) a nitrogen-containing organohydroxyl compound, (2) an alkylene glycol monoalkyl ether represented by the general formula: HO&mdash;(C H O) &mdash;R, wherein R is C -C alkyl, p is 2 or 3, and q is 1, 2 or 3, (3) sugar or sugar alcohol, (4) a phosphorus-containing compound and (5) water. The photoresist stripping composition easily removes photoresist films on the inorganic substrate, and patterned photoresist films and photoresist residues remaining after etching and photoresist residues in a short period of time without corroding semiconductive materials, circuit-forming materials, insulating materials, etc.

Photoresist stripping composition and process for stripping photoresist

Growing community of inventors

Osaka, Japan

Yukihiko Takeuchi