Ricoh Company, Ltd.

Yukie Inoue

Naohiro Toda

Hiroyuki Yamashita

Takuma Nakamura

Masaya Hamaguchi

Shinji Aoki

Dan Ozasa

Toshihiro Kanematsu

Masahiro Masuzawa

Masaru Ohgaki

Shinya Seno

Hisayoshi Ohshima

A line head type liquid discharge apparatus includes a treatment liquid applying device, a first discharging device, a heating device, and a second discharging device. The treatment liquid applying device applies a treatment liquid to a non-permeable base material. The first discharging device discharges a first ink containing an organic solvent onto the non-permeable base material to which the treatment liquid has been applied. The heating device heats, with an infrared ray, the non-permeable base material onto which the first ink has been discharged. The second discharging device discharges a second ink containing an organic solvent onto the non-permeable base material heated by the heating device. A content ratio of the organic solvent contained in the first ink is higher than a content ratio of the organic solvent contained in the second ink.

Liquid discharge apparatus and liquid discharge method

A dryer includes a conveyor to convey a film including a first surface onto which a liquid is applied, a noncontact heater to heat the first surface of the film conveyed by the conveyor without contacting the first surface, a contact heater to contact and heat a second surface of the film opposite the first surface, and circuitry to set a first heating temperature of the contact heater less than 85&#xb0; C. and set a second heating temperature of the noncontact heater to be 30&#xb0; C. to 90&#xb0; C. higher than the first heating temperature.

Dryer, liquid discharge apparatus, drying method, and inkjet recording apparatus

A high-frequency dielectric heating device includes: a high-frequency generating unit to generate a high-frequency electric field; multiple power amplifiers configured to amplify the high-frequency electric field; multiple electrode sections to apply the amplified high-frequency electric field to each of divided areas on a heated material; multiple matching units to detect an incident wave and a reflected wave between the power amplifiers and the electrode sections, respectively, and conduct impedance matching; multiple voltage detecting units to detect a voltage of each of the electrode sections; and a controller to control at least any of the high-frequency generating unit and the power amplifiers in accordance with a voltage, detected by the voltage detecting units, and control a setting for the matching unit such that a reflected wave, detected by the matching unit, is zero in accordance with an incident wave and a reflected wave that are detected by the matching unit.

High-frequency dielectric heating device and image forming apparatus

A disclosed method for producing a hollow cell array structure includes a first step of layering a deformable material capable of being plastically deformed under a predetermined condition on a first substrate, the first substrate having plural, mutually separated depressions in a surface thereof, such that the deformable material forms mutually isolated spaces in the corresponding depressions; a second step of expanding the spaces in the plural depressions by inducing a gas pressure of the spaces while extending the deformable material on the first substrate, such that plural hollow cells are simultaneously formed in correspondence to the plural depressions in predetermined directions; and a third step of selectively solidifying portions of the plural hollow cells by selectively applying ultraviolet rays thereto.

Hollow cell array structure and method and apparatus for producing hollow cell array structure

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Kanagawa, Japan

Yukie Inoue