Nikon Corporation

Nikon Research Corporation of America

Yuki Terui

Yutaka Sasaki

Eric Peter Goodwin

Ichiro Sase

Masafumi Mimura

Takaaki Okamoto

Zhiqiang Liu

Miroslav Svoboda

Kohki Konishi

Yosuke Fujikake

Martin Berger

Petr Gazak

An image processor includes an image generator configured to generate corresponding image data corresponding to first microscopic image data obtained under a first observation condition, based on second microscopic image data and third microscopic image data obtained under a second observation condition, and an image output unit configured to output the corresponding image data. The corresponding image data may be image data corresponding to a first focal plane from which the first microscopic image data are obtained, and wherein the second microscopic image data and the third microscopic image data may be image data on a second focal plane and a third focal plane, respectively, which are different from the first focal plane.

Image processing device, microscope system, image processing method, and program

To acquire an image of a sample. A microscope includes: an illumination optical system that includes a light flux splitter that splits light from a light source into a plurality of light fluxes, and scans a sample in a plurality of directions with interference fringes generated by interference of at least part of the light fluxes split by the light flux splitter; a detection optical system on which light from the sample is incident; a detection device that includes a plurality of detectors that detect the light from the sample via the detection optical system; and an image processor that generates an image using detection results of two or more of the detectors of the detection device.

Microscope and observation method

An optical system configured as part of optical metrology unit used to assess the operational status of a workpiece and, in a specific case, configured as an encoder head of a lithographic exposure tool. The optical system is devoid of a stand-alone optical corner-cubes and includes, instead, a single, imperfect or frustrated cuboid of optically-isotropic material that, in operation with the diffraction grating of the workpiece, simultaneously forms four interferometric signals for measuring x-, y, and z-positions of the workpiece grating relative to the optical system. Proposed system and method solve problems of (i) structural complexity of a conventional metrology unit for use in an exposure tool, (ii) burdensome alignment of the multitude of optical prisms in the process of forming such metrology unit, and (iii) cyclic non-linear errors associated with measurements involving conventional corner-cubes-based metrology units.

Optical system with a frustrated isotropic block

Growing community of inventors

Tokyo, Japan

Yuki Terui