Sumitomo Chemical Company, Limited

Teijin Limited

The University of Tokyo

Yuki Suzuki

Koji Ichikawa

Tatsuro Masuyama

Masahiko Shimada

Satoshi Yamaguchi

Tatsuya Suzuki

Isao Yoshida

Tatsuya Okubo

Yuichi Mukai

Takeshi Naito

Masayuki Chokai

Takuya Murakami

Tsuyoshi Matsushita

An object of the present invention is to provide a sizing agent composition that gives a carbon fiber from which a carbon fiber-reinforced composite material having excellent adhesion between a resin and the carbon fiber and having excellent mechanical properties can be formed. The sizing agent composition of the invention is a sizing agent composition comprising (A) a blocked isocyanate, and (B) a compound containing at least one polar group and at least one unsaturated group per molecule. In the invention, the mixing ratio (mass ratio) of the blocked isocyanate (A) and the compound (B) containing at least one polar group and at least one unsaturated group per molecule (A/B) is preferably 95/5 to 5/95. In the invention, the blocked isocyanate (A) is preferably a compound having an aliphatic skeleton.

Sizing agent composition, method for producing carbon fibers, and carbon fibers each having sizing agent applied thereonto

A resist composition which contains a resin (A1) which has a structural unit represented by formula (I), a structural unit represented by formula (II) and a structural unit having an acid-labile group, and an acid generator: wherein Rand R2 independently represent a hydrogen atom, a halogen atom or a Calkyl group that may have a halogen atom, Rrepresents a carboxy group, a cyano group or a Caliphatic hydrocarbon group, Arepresents a single bond, *-A-O&#x2014;, *-A-CO&#x2014;O&#x2014;, etc., Aand Aindependently represents a Calkanediyl group, and w1 represents an integer of 0 to 8, Lrepresents a single bond or *-L-CO&#x2014;O-(L-CO&#x2014;O)&#x2014;, Land Lindependently represent a Cdivalent hydrocarbon group, g represent 0 or 1, Rrepresents a Cliner or branched alkyl group except for a tertiary alkyl group and * represents a binding position to an oxygen atom.

Resist composition

A resist composition includes (A1) a resin which includes a structural unit represented by formula (a4), and a structural unit having an adamantane lactone group, and the resin has no acid-labile group, (A2) a resin having an acid-labile group, and an acid generator. In the formula (a4), Rrepresents a hydrogen atom or a methyl group, and Rrepresents a Cto Csaturated hydrocarbon group having a fluorine atom, and a methylene group of the saturated hydrocarbon group may be replaced by an oxygen atom or a carbonyl group.

Resin, resist composition and method for producing resist pattern

A compound represented by formula (I): wherein Rrepresents a hydrogen atom, a halogen atom or a Cto Calkyl group in which a hydrogen atom may be replaced by a halogen atom, Rrepresents a Cto Chydrocarbon group consisting of the following groups (a) and (b): (a) a liner or branched divalent hydrocarbon group and (b) an alicyclic hydrocarbon group, Rfand Rfeach independently represent a Cto Cperfluoroalkyl group, Arepresents a single bond, a Cto Calkanediyl group or *-A-X-(A-X)-(A)-, * represents a binding site to an oxygen atom, A, Aand Aeach independently represent a Cto Calkanediyl group, Xand Xeach independently represent &#x2014;O&#x2014;, &#x2014;CO&#x2014;O&#x2014; or &#x2014;O&#x2014;CO&#x2014;, a represents 0 or 1, and b represents 0 or 1.

Compound, resin, resist composition and method for producing resist pattern

A resist composition include (A1) a resin which includes a structural unit represented by formula (a4), and which resin has neither an acid-labile group nor an aromatic ring, (A2) a resin having an acid-labile group, and an acid generator,  wherein Rrepresents a hydrogen atom or a methyl group, Rrepresents a Cto Csaturated hydrocarbon group having a fluorine atom, and a methylene group contained in the saturated hydrocarbon group may be replaced by an oxygen atom or a carbonyl group; and a structural unit having a ketone group.

A resist composition includes (A1) a resin which includes a structural unit represented by formula (a4), a structural unit having a cyclic ether, and the resin has no acid-labile group, (A2) a resin having an acid-labile group, and an acid generator: wherein Rrepresents a hydrogen atom or a methyl group, and Rrepresents a Cto Csaturated hydrocarbon group having a fluorine atom and a methylene group contained in the saturated hydrocarbon group may be replaced by an oxygen atom or a carbonyl group.

A compound represented by formula (I): wherein Rrepresents a hydrogen atom or a methyl group;

Compound, resin and photoresist composition

A resist composition includes (A1) a resin which includes a structural unit represented by formula (a4), a structural unit represented by formula (II), the resin has no acid-labile group, (A2) a resin having an acid-labile group, and an acid generator: wherein Rrepresents a hydrogen atom or a methyl group, and Rrepresents a Cto Csaturated hydrocarbon group having a fluorine atom where a methylene group may be replaced by an oxygen atom or a carbonyl group; Rrepresents a hydrogen atom, a halogen atom or a Cto Calkyl group that may have a halogen atom; ring Xrepresents a Cto Cheterocyclic group containing a nitrogen atom and a carbonyl group, a hydrogen atom contained in the heterocyclic group may be replaced by a halogen atom, a hydroxy group, a Cto Chydrocarbon, a Cto Calkoxyl group, a Cto Cacyl group, or a Cto Cacyloxy group, and a methylene group contained in the heterocyclic group may be replaced by an oxygen atom or a carbonyl group.

A resist composition having a resin having a structural unit represented by the formula (I), a resin being insoluble or poorly soluble in alkali aqueous solution, but becoming soluble in an alkali aqueous solution by the action of an acid and not including the structural unit represented by the formula (I), and an acid generator having an acid labile group, 

Resist composition and method for producing resist pattern

A salt represented by the formula (I): wherein Q, Q, L, L, ring W, s, t, R, Rand Zare defined in the specification.

Salt, photoresist composition and process for producing photoresist pattern

A resist composition includes (A1) a resin having a structural unit represented by the formula (I), (A2) a resin being insoluble or poorly soluble in alkali aqueous solution, but becoming soluble in an alkali aqueous solution by the action of an acid and (B) an acid generator having an acid-labile group. 

The present invention provides a method which can produce &#x3b5;-caprolactam with a good selectivity by reacting cyclohexanone oxime with a good conversion in a vapor phase Beckmann rearrangement reaction. Disclosed is a method for producing &#x3b5;-caprolactam, which comprises performing a vapor phase Beckmann rearrangement reaction of cyclohexanone oxime in the presence of a pentasil type zeolite, wherein the pentasil type zeolite is a zeolite obtained by subjecting a mixture containing a silicon compound, water, and a compound represented by formula (I):[(R)N&#x2014;(CH)&#x2014;N(R)&#x2014;(CH)&#x2014;N(R)]&#xb7;3/(A)&#x2003;&#x2003;(I)wherein Rrepresents an alkyl group having 1 to 4 carbon atoms, A represents an n-valent anion, m represents an integer of 5 to 7, and n represents an integer of 1 to 3, to a hydrothermal synthesis reaction.

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Osaka, Japan

Yuki Suzuki