Nissan Chemical Corporation

Yuki Hoshino

Shojiro Yukawa

Kayo Takeda

This cured film-forming resin composition is characterized in comprising: as a component (A), a polymer containing a structural unit derived from a first monomer having the structure with formula (1); a photoacid generator as a component (B); fine particles as a component (C); and a solvent (in the formula, Rrepresents hydrogen or a methyl group and Rrepresents an organic group capable of undergoing elimination with the oxygen atom bonded thereto). The cured film-forming resin composition forms a cured film that has solvent resistance to organic solvents and a high liquid repellency (lyophobicity) wherein the lyophilicity/lyophobicity can be easily varied using small ultraviolet exposure doses and the lyophilic areas have a high lyophilicity even for high surface tension liquids.

Cured film-forming composition

Provided are: a cured film-forming composition whereby a underlayer film for image formation formed from the composition exhibits high liquid repellency (lyophobicity) and lyophilic/liquid-repellent properties of the underlayer film can be easily changed even when exposed to a low amount of ultraviolet radiation; and a cured film obtained using the composition. The cured film-forming resin composition is characterized by containing: a polymer comprising a structural unit derived from a first monomer having the structure of formula (1) as component (A); a polymer other than component (A), which is a polymer in which the content of fluorine relative to the overall weight of the polymer is lower than in component (A), as component (B); a photoacid generator as component (C); and a solvent. (In the formula, Rdenotes hydrogen or a methyl group, and Rdenotes a fluorine-containing group able to be detached together with the oxygen atom bonded to R.) 

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Funabashi, Japan

Yuki Hoshino