Hitachi High-Tech Corporation

Yuki Doi

Yuji Takagi

Minoru Harada

Yohei Minekawa

Naoaki Kondo

Hideki Nakayama

In learning processing performed before sample observation processing (steps Sto S), the sample observation device acquires a low-picture quality learning image under a first imaging condition for each defect position indicated by defect position information, determines an imaging count of a plurality of high-picture quality learning images associated with the low-picture quality learning image for each defect position and a plurality of imaging points based on a set value of the imaging count, acquires the plurality of high-picture quality learning images under a second imaging condition (step S), learns a high-picture quality image estimation model using the low-picture quality learning image and the plurality of high-picture quality learning images (step S), and adjusts a parameter related to the defect detection in the sample observation processing using the high-picture quality image estimation model (step S).

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Tokyo, Japan

Yuki Doi