Agc Inc.

Asahi Glass Company, Limited

Agc Glass Europe

Agc Flat Glass North America, Inc.

Agc Vidros Do Brasil Ltda.

Yuki Aoshima

Toshihiro Kugimiya

Nobutaka Aomine

Kazushi Hayashi

Hiroshi Hanekawa

Hirotomo Kawahara

Kazunobu Maeshige

Philippe Roquiny

Reo Usui

Benoit Domercq

Takashi Kobori

Hidefumi Odaka

Satoru Tomeno

Misa Inamoto

Takeshi Tomizawa

Sophie Billet

The present invention relates to a glass sheet including a first main surface and a second main surface opposing the first main surface, in which the glass sheet has an affected layer directly below the first main surface, in at least a part of the first main surface, an average element length RSm is from 2500 nm to 6000 nm, a root-mean-square height Sq is from 3 nm to 45 nm, and a skewness Ssk is a negative value.

Glass plate, glass plate having anti-reflection layer, and method for producing glass plate

A laminated substrate for an electrochromic dimmer element includes a glass substrate; and a transparent conductive film. The glass substrate includes a silicon oxide, an aluminum oxide, a boron oxide, an alkaline earth metal oxide, and an alkali metal oxide in a total amount of 90 mol % or more, and includes the alkali metal oxide in a total amount of 12 mol % or less. The transparent conductive film includes an indium oxide film containing tin, and a tin oxide film containing at least one of tantalum, antimony and fluorine, in this order from a glass substrate side. The indium oxide film is formed directly on the glass substrate, a refractive index and an extinction coefficient of the indium oxide film at a wavelength of 1.3 &#x3bc;m is less than 0.4, and greater than 0.4, respectively. A film thickness of the tin oxide film is greater than 35 nm.

Laminated substrate for electrochromic dimmer element and manufacturing method for electrochromic dimmer element

A substrate with conductive film includes a base material; and a film of a conductive metal oxide arranged on an upper part of the base material. The film includes, by a top plan view, a first region and a second region, the second region is configured of a same material as the first region, and an electric resistance of the second region is higher than an electric resistance of the first region. The second region includes a part configured by a plurality of cellular sections surrounded by a plurality of fine cracks. In the part, each fine crack has a width of 1 nm to 50 nm, and each cellular section has a largest measure of less than 10 &#x3bc;m.

Substrate with conductive film

A method of producing a glass substrate having a first layer formed on a surface of the substrate by low-temperature CVD includes preparing the glass substrate and forming the first layer on the glass substrate by the low-temperature CVD. In the glass substrate after forming the first layer, an integrated value after a baseline correction in a wavenumber range of 2600 cmto 3800 cmin a peak due to OH groups obtained by an FTIR measurement on the first layer is 9.0 or less, and the C content of the first layer is 1.64 at % or less.

Method of producing glass substrate and glass substrate

A plasma source for a plasma CVD apparatus that includes an electrode group including four electrodes, which are a first electrode, a second electrode, a third electrode and a fourth electrode arranged in a row. The electrode group is connected to at least one AC power supply. A voltage supplied to two of the four electrodes is shifted in phase from a voltage supplied to the remaining two electrodes. A space to which a source gas is supplied is provided between the adjacent electrodes, and voltages applied to at least one set among the adjacent two electrodes are in the same phase.

Plasma source for a plasma CVD apparatus and a manufacturing method of an article using the plasma source

A glass substrate provided with a coating film, including a glass substrate and a coating film containing at least one TiOlayer having a refractive index of at least 2.20 at a wavelength of 632 nm, formed by low temperature plasma CVD method on the glass substrate, and a method for producing a glass substrate provided with a coating film, which includes forming a TiOlayer on a glass substrate by low temperature plasma CVD method using a film-forming material containing at least one member selected from an alkoxide type titanium material, an amide type titanium material and a halide type titanium material, at a plasma power density of at least 55 kW/m at a film-forming rate of from 15 to 200 nm&#xb7;m/min.

Coating film-equipped glass substrate, and method for producing coating film-equipped glass substrate

The invention relates to a substrate () comprising a medium (), said medium () comprising, on at least one of its main faces, a functional layer () that has low-E or antisolar properties or is electrically conductive, characterized in that said functional layer () comprises, on its extreme surface opposite the medium (), at least one sulphurous compound, in particular a sulphate, a sulphonate and/or a thiosulphate.

Substrate with a functional layer comprising a sulphurous compound

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Tokyo, Japan

Yuki Aoshima