Sumitomo Chemical Company, Limited

Yukako Harada

Isao Yoshida

Satoshi Yamaguchi

Ichiki Takemoto

Nobuo Ando

Yoshiyuki Takata

Kouji Toishi

Hiromu Sakamoto

Takayuki Miyagawa

Masumi Suetsugu

Makoto Akita

Junji Shigematsu

The present invention provides a resin which generates an acid by irradiation and is a salt of an organic cation and an anionic polymer wherein the anionic polymer has no carbon-carbon unsaturated bond. The present invention further provides a chemically amplified resist composition comprising the same.

Chemically amplified positive resist composition

The present invention provides a salt of the formula (L) A salt of the formula (L): wherein Q represents &#x2014;CO&#x2014; group or &#x2014;C(OH)&#x2014; group; ring X represents monocyclic or polycyclic hydrocarbon group having 3 to 30 carbon atoms in which a hydrogen atom is substituted with a hydroxyl group at Q position when Q is &#x2014;C(OH)&#x2014; group or in which two hydrogen atoms are substituted with &#x2550;O group at Q position when Q is &#x2014;CO&#x2014; group, and at least one hydrogen atom in the monocylic or polycyclic hydrocarbon group may optionally be substituted with alkyl group having 1 to 6 carbon atom, alkoxy group having 1 to 6 carbon atom, perfluoroalkyl group having 1 to 4 carbon atoms, hydroxyalkyl group having 1 to 6 carbon atoms, hydroxyl group or cyano group; Rand Reach independently represent fluorine atom or perfluoroalkyl group having 1 to 6 carbon atoms; and Arepresents organic counter ion. The present invention also provides a chemically amplified resist composition comprising the salt of the formula (L).

Salt suitable for an acid generator and a chemically amplified resist composition containing the same

Resin suitable for an acid generator

The present invention provides a salt represented by the formula (I): wherein P, P, P, Q, Qand R are defined in the specification and the present invention further provides a chemically amplified resist composition comprising the salt represented by the above-mentioned formula (I).

Salt suitable for an acid generator and a chemically amplified positive resist composition containing the same

The present invention provides a salt of the formula (I): wherein ring X represents monocyclic or polycyclic hydrocarbon group having 3 to 30 carbon atoms, and one or more hydrogen atom in the monocyclic or polycyclic hydrocarbon group is optionally substituted with alkyl group having 1 to 10 carbon atom, alkoxy group having 1 to 10 carbon atom, perfluoroalkyl group having 1 to 4 carbon atoms, hydroxyalkyl group having 1 to 10 carbon atoms or cyano group; Qand Qeach independently represent fluorine atom or perfluoroalkyl group having 1 to 6 carbon atoms; and Arepresents organic counter ion. The present invention also provides a chemically amplified resist composition comprising the salt of the formula (I).

A chemically amplified positive resist composition comprising (A) a salt represented by the formula (I):AOS&#x2014;R&#x2003;&#x2003;(I)wherein R represents a 9,10-anthraquinonyl group which may be substituted with at least one group selected from the group consisting of a C1-C4 alkyl group, a C1-C4 alkoxy group and a hydroxyl group, and the C1-C4 alkyl group and the C1-C4 alkoxy group may be substituted, and Arepresents an organic counter cation, and(B) a resin which contains a structural unit which has an acid-labile group and which itself is insoluble or poorly soluble in an aqueous alkali solution but becomes soluble in an aqueous alkali solution by the action of an acid.

The present invention provides a salt represented by the formula (I): wherein

The present invention provides a sulfonium compound represented by the formula (I): wherein Qand Qeach independently represent a fluorine atom or a C1-C6 perfluoroalkyl group, and Arepresents an organic counter ion.

Sulfonium compound

The present invention provides a salt represented by the formula (I): wherein X represents an n-valent connecting group, Yand Yeach independently represent a fluorine atom or a C1-C6 perfluoroalkyl group, n represents 2 or 3, and Arepresents an organic counter ion. The present invention further provides a chemically amplified resist composition comprising the salt represented by the above-mentioned formula (I).

The present invention provides a salt of the formula (I): wherein ring Y represents monocyclic or polycyclic hydrocarbon group having 3 to 30 carbon atoms, in which one &#x2014;CH&#x2014; group is substituted with &#x2014;COO&#x2014; group, and at least one hydrogen atom in the monocyclic or polycyclic hydrocarbon group may optionally be substituted with alkyl group having 1 to 6 carbon atom, alkoxy group having 1 to 6 carbon atom, perfluoroalkyl group having 1 to 4 carbon atoms, hydroxyalkyl group having 1 to 6 carbon atoms, hydroxyl group or cyano group; Qand Qeach independently represent fluorine atom or perfluoroalkyl group having 1 to 6 carbon atoms; Arepresents organic counter ion; and n shows an integer of 0 to 12. The present invention also provides a chemically amplified resist composition comprising the salt of the formula (I).

The present invention provides a salt of the formula (I): wherein ring X represents polycyclic hydrocarbon group having tricycle or more and having 10 to 30 carbon atoms, and one or more hydrogen atom in the ring X is optionally substituted with alkyl group having 1 to 6 carbon atoms, alkoxy group having 1 to 6 carbon atoms, perfluoroalkyl group having 1 to 4 carbon atoms or cyano group; Qand Qeach independently represent fluorine atom or perfluoroalkyl group having 1 to 6 carbon atoms; n shows an integer of 1 to 12; and Arepresents a cation selected from the group consist of a cation of the following formulae (IIa), (IIb) and (IIc):  The present invention also provides a chemically amplified resist composition comprising the salt of the formula (I).

The present invention provides a salt of the formula (I): wherein X represents alkylene group or substituted alkylene group; Qand Qeach independently represent fluorine atom or perfluoroalkyl group having 1 to 6 carbon atoms; Arepresents organic counter ion; and n shows 0 or 1. The present invention also provides a chemically amplified resist composition comprising the salt of the formula (I), and a resin which contains a structural unit having an acid-labile group and which itself is insoluble or poorly soluble in an alkali aqueous solution but becomes soluble in an alkali aqueous solution by the action of an acid.

A salt represented by the formula (I): wherein X represents a C1-C12 divalent linear or branched chain hydrocarbon group, Y represents a C1-C30 hydrocarbon group which may be substituted with at least one substituent, and at least one &#x2014;CH&#x2014; in the C1-C30 hydrocarbon group may be substituted with &#x2014;O&#x2014; or &#x2014;CO&#x2014;, Qand Qeach independently represent a fluorine atom or a C1-C6 perfluoroalkyl group, and Arepresents an organic counter ion. The present invention further provides a chemically amplified resist composition comprising the salt represented by the above-mentioned formula (I).

The present invention provides a salt of the formula (I) wherein X represents &#x2014;OH or &#x2014;Y&#x2014;OH, n shows an integer of 1 to 9, Arepresents an organic counter ion, Y represents a divalent saturated aliphatic hydrocarbon group having 1 to 6 carbon atoms. The present invention also provides a chemically amplified resist composition comprising the salt of the formula (I).

The present invention provides a salt of the formula (I): wherein ring X represents monocyclic or bicyclic hydrocarbon group having 3 to 30 carbon atoms, and one or more hydrogen atom in the ring X is optionally substituted with alkyl group having 1 to 6 carbon atoms, alkenyl group having 2 to 6 carbon atoms, alkoxy group having 2 to 6 carbon atoms or perfluoroalkyl group having 1 to 4 carbon atoms; Qand Qeach independently represent fluorine atom or perfluoroalkyl group having 1 to 6 carbon atoms; Arepresents organic counter ion; and n shows an integer of 1 to 12. The present invention also provides a chemically amplified resist composition comprising the salt of the formula (I).

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Settu, Japan

Yukako Harada