Sumitomo Chemical Company, Limited

Yukako Anryu

Koji Ichikawa

Shingo Fujita

Satoshi Yamaguchi

Tatsuro Masuyama

Satoshi Yamamoto

Takayuki Miyagawa

Takahiro Yasue

Mitsuyoshi Ochiai

Masafumi Yoshida

Singo Fujita

Described are a salt and a resist composition capable of producing a resist pattern with satisfactory line edge roughness (LER). The salt is represented by formula (I): In formula (I), R, R, R, Rand Reach independently represent a halogen atom or a perfluoroalkyl group having 1 to 6 carbon atoms, R, Rand Reach independently represent a halogen atom, a hydroxy group, a fluorinated alkyl group having 1 to 6 carbon atoms or an alkyl group having 1 to 12 carbon atoms, and &#x2014;CH&#x2014; included in the alkyl group may be replaced by &#x2014;O&#x2014; or &#x2014;CO&#x2014;, m5 represents an integer of 1 to 5, m6 represents an integer of 0 to 3, m7 represents an integer of 0 to 3, m8 represents an integer of 0 to 4, and AIrepresents an organic anion.

Salt, acid generator, resist composition and method for producing resist pattern

Disclosed are a carboxylate represented by formula (I), and a carboxylic acid generator and a resist composition, including the same: wherein Rrepresents a fluorine atom or a fluorinated alkyl group having 1 to 4 carbon atoms; R, Rand Reach independently represent a halogen atom, a fluorinated alkyl group having 1 to 4 carbon atoms or a hydrocarbon group having 1 to 12 carbon atoms, and &#x2014;CH&#x2014; included in the hydrocarbon group may be replaced by &#x2014;O&#x2014; or &#x2014;CO&#x2014;; m2 and m3 represent an integer of 0 to 4, and m4 represents an integer of 0 to 5; and Xrepresents a hydrocarbon group having 1 to 72 carbon atoms which may have a substituent, and &#x2014;CH&#x2014; included in the hydrocarbon group may be replaced by &#x2014;O&#x2014;, &#x2014;S&#x2014;, &#x2014;CO&#x2014; or &#x2014;SO&#x2014;.

Carboxylate, carboxylic acid generator, resist composition and method for producing resist pattern

Disclosed is a resist composition including a compound represented by formula (I), a resin having an acid-labile group and an acid generator, the resin having an acid-labile group including at least one selected from the group consisting of a structural unit represented by formula (a1-1) and a structural unit represented by formula (a1-2):

Resist composition and method for producing resist pattern

Disclosed is a resist composition including a compound represented by formula (I), a resin having an acid-labile group and an acid generator: wherein, in formula (I),

A salt represented by formula (I): wherein Qand Qeach independently represent a fluorine atom or a Cto Cperfluoroalkyl group, Rand Reach independently represent a hydrogen atom, a fluorine atom or a Cto Cperfluoroalkyl group, z represents an integer of 0 to 6, Xrepresents *&#x2014;O&#x2014;, *&#x2014;CO&#x2014;O&#x2014; or *&#x2014;O&#x2014;CO&#x2014;, * represents a binding site to CRRor CQQ, Lrepresents a Cto Calkanediyl group, Rrepresents a Cto Calicyclic hydrocarbon group in which a hydrogen atom may be replaced by a hydroxy group, and in which a methylene group may be replaced by an oxygen atom or a carbonyl group, and which alicyclic hydrocarbon group may have a cyclic ketal structure optionally having a fluorine atom; and Zrepresents an organic cation.

A salt capable of producing a resist pattern with excellent line edge roughness is represented by formula (I): wherein, Rrepresents &#x2014;(X&#x2014;O)&#x2014;R, and o represents an integer of 0 to 6, Rrepresents a hydrocarbon group having 1 to 12 carbon atoms, Xrepresents a divalent hydrocarbon group having 2 to 12 carbon atoms, Rrepresents an alkyl group having 1 to 12 carbon atoms or the like, I represents an integer of 0 to 3, and when I is 2 or more, a plurality of Rmay be the same or different from each other, Rand Reach represent a hydrogen atom or the like, m and n each represent 1 or 2, Xrepresents a single bond, &#x2014;CH&#x2014;, &#x2014;O&#x2014; or &#x2014;S&#x2014;, and Rand Reach represent an alkyl group having 1 to 4 carbon atoms which has a fluorine atom or the like.

Disclosed are a salt represented by formula (I), and an acid generator and a resist composition which include the same: 

A salt represented by formula (I):  In formula (I), R, R, Rand Reach independently represent a halogen atom or a perfluoroalkyl group having 1 to 6 carbon atoms, R, Rand Reach independently represent a halogen atom, a hydroxy group, a fluorinated alkyl group having 1 to 6 carbon atoms or an alkyl group having 1 to 12 carbon atoms, and &#x2014;CH&#x2014; included in the alkyl group may be replaced by &#x2014;O&#x2014; or &#x2014;CO&#x2014;, m5 represents an integer of 0 to 3, m6 represents an integer of 0 to 3, m7 represents an integer of 0 to 3, Rand Reach independently represent a hydrogen atom or an alkyl group having 1 to 12 carbon atoms, and &#x2014;CH&#x2014; included in the alkyl group may be replaced by &#x2014;O&#x2014; or &#x2014;CO&#x2014;, and Alrepresents an organic anion.

A salt represented by formula (I): in which X represents an oxygen atom, a sulfur atom or &#x2014;N(SOR)&#x2014;;

Salt, acid generator, photoresist composition and process of producing photoresist pattern

A compound represented by formula (I), a resin including a structural unit derived from the compound and a resist composition including the resin: wherein Rrepresents a hydrogen atom, a halogen atom or a Cto Calkyl group in which a hydrogen atom may be replaced by a halogen atom, Rrepresents a Cto Cperfluoroalkyl group or *&#x2014;CHRR, * represents a binding site to a carbonyl group, Rand Reach independently represent a Cto Cperfluoroalkyl group or Rand Rmay be bonded together with a carbon atom bonded thereto to form a ring, Arepresents a single bond, a Cto Calkanediyl group or **-A-X-(A-X)-(A)-, ** represents a binding site to an oxygen atom, A, A, Aand Aeach independently represent a Cto Calkanediyl group, Xand Xeach independently represent &#x2014;O&#x2014;, &#x2014;CO&#x2014;O&#x2014; or &#x2014;O&#x2014;CO&#x2014;, a and b each represent 0 or 1, and Wrepresents a Cto Cdivalent alicyclic hydrocarbon group.

Compound, resin, resist composition and method for producing resist pattern

A salt represented by formula (I): wherein Rand Rindependently represent a hydrogen atom, a hydroxy group or a Cto Chydrocarbon group in which a methylene group may be replaced by a &#x2014;O&#x2014; or &#x2014;CO&#x2014;; m and n independently represent 1 or 2; Ar represents an optionally substituted phenyl group; Qand Qindependently represent a fluorine atom or a Cto Cperfluoroalkyl group, Arepresents a single bond, a Cto Calkanediyl group or the like, and Y represents an optionally substituted Cto Calkyl group or monovalent Cto Calicyclic hydrocarbon group, and a methylene group therein may be replaced by a &#x2014;O&#x2014;, O&#x2014; or &#x2014;SO&#x2014;, provided that the alkyl group or the alicyclic hydrocarbon group has at least one substituent, or at least one methylene group contained therein is replaced by a &#x2014;O&#x2014;, &#x2014;CO&#x2014; or &#x2014;SO&#x2014;.

Salt, acid generator, photoresist composition, and method for producing photoresist pattern

Salt and photoresist composition comprising the same

A salt represented by formula (I): wherein Rand Rindependently in each occurrence represent a hydrogen atom, a hydroxy group or a C1-C12 hydrocarbon group where a methylene group can be replaced by an oxygen atom or a carbonyl group;Arand Areach independently represent a C6-C36 aromatic hydrocarbon group which can have a substituent or a C6-C36 heteroaromatic hydrocarbon group which can have a substituent;Aand A'each independently represent an organic anion; and'm' and 'n' independently each represent an integer of 1 to 2.

The present invention provides a salt represented by the formula (I): wherein R, R, L, Y, R, R, R, R, R, n, s, and Rrepresent variables outlined in the specification.

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Osaka, Japan

Yukako Anryu