Hitachi High-Tech Corporation

Yuka Sugawara

Riku Tamura

Yuichiro Hashimoto

Hiroyuki Yasuda

Provided are a mass spectrometer and a method for controlling the same capable of suppressing decrease in sensitivity even where the atmospheric pressure around the mass spectrometer varies. The mass spectrometer includes an ion source, a mass analysis unit, a control unit, and a storage unit. The ion source includes an ion source chamber, an inlet, a first gas introduction port, a second gas introduction port, an outlet, and a gas discharge port. The storage unit stores a table indicating a relationship between a measurement condition and a flow rate of the second gas. The control unit changes the flow rate of the second gas according to the measurement condition on the basis of the table, and controls a flow rate of the first gas to suppress a variation in a pressure inside the ion source chamber.

Mass spectrometer and method for controlling same

There is provided a mass spectrometer that can appropriately maintain the atmospheric pressure of a vacuum chamber, and a method of controlling the same. An example of a mass spectrometer according to the present invention includes first vacuum chambers, first vacuum pumps, an atmospheric pressure relating value acquiring unit, and an adjustment unit configured to adjust the effective exhaust velocity of the first vacuum pumps, and controllers. The controllers control the adjustment unit corresponding to an atmospheric pressure relating value.

Mass spectrometer and method of controlling the same

There is provided a specimen analyzer that can measure carry-over without degrading a specimen processing capability. A specimen analyzer according to the present invention measures a first sample including a first specimen and a first internal reference material, subsequently measures a second sample including a second specimen and a second internal reference material, and calculates an amount of the second specimen included in the second sample using an amount of the first internal reference material measured when the first sample has been measured and an amount of the second internal reference material measured when the second sample has been measured.

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Tokyo, Japan

Yuka Sugawara