Sony Semiconductor Solutions Corporation

Sony Corporation

Yuka Nakamoto

Yukihiro Sayama

Sintaro Nakajiki

Nobuyuki Ohba

Yuichi Seki

Toshinori Inoue

The present technology relates to a solid-state imaging device, a manufacturing method, and an electronic device, which can improve sensitivity while improving color mixing. The solid-state imaging device includes a first wall provided between a pixel and a pixel arranged two-dimensionally to isolate the pixels, in which the first wall includes at least two layers including a light shielding film of a lowermost layer and a low refractive index film of which refractive index is lower than the light shielding film. The present technology can be applied to, for example, a solid-state imaging device, an electronic device having an imaging function, and the like.

Solid-state imaging device, manufacturing method thereof, and electronic device

There is provided a solid-state imaging device including: an imaging pixel including a photoelectric conversion unit which receives incident light; and a phase difference detection pixel including the photoelectric conversion unit and a light shielding unit which shields some of the light incident to the photoelectric conversion unit, in which the imaging pixel further includes a high refractive index film which is formed on the upper side of the photoelectric conversion unit, and the phase difference detection pixel further includes a low refractive index film which is formed on the upper side of the photoelectric conversion unit.

Solid-state imaging device, manufacturing method of the same, and electronic apparatus having filters of different thicknesses

Solid-state imaging device with phase difference detection pixel and manufacturing method of the same, and electronic apparatus

Solid-state imaging device and manufacturing method of the same, and electronic apparatus

Growing community of inventors

Kumamoto, Japan

Yuka Nakamoto