Nuflare Technology, Inc.

Yujin Handa

Hayato Kimura

Seiji Wake

Seiichi Tsuchiya

Takuya Matsukawa

Tomohiro Iijima

Kei Hasegawa

Data including information related to each area with a graphic disposed therein is inputted to the writing apparatus. The area is delimited with meshes each having a predetermined size. Next, an area value of a graphic lying within each of the meshes and its center-of-gravity position are determined. For every mesh, a check is made whether the area value is less than or equal to a predetermined value. When the area value is less than or equal to the predetermined value, a range allowable for an x coordinate of the center-of-gravity position is determined and a check is made whether an actual x coordinate falls within this range. Next, a range allowable for a y coordinate of the center-of-gravity position is determined and a check is made whether an actual y coordinate falls within this range.

Data verification method and charged particle beam writing apparatus

A pattern writing circuit self-diagnosis method for a charged beam photolithography apparatus and a charged beam photolithography apparatus which enable to maintain normality of the charged beam photolithography apparatus are provided. The pattern writing circuit self-diagnosis method for a charged beam photolithography apparatus is a pattern writing circuit self-diagnosis method for a charged beam photolithography apparatus which irradiates a charged beam on a target sample to write a desired pattern. Layout information and a pattern writing conditions which is prepared in advance are input to the pattern writing circuit, and processing result data of the pattern writing circuit output as a result of the inputting is collected. The collected processing result data of the pattern writing circuit is compared with correct data. The charged beam photolithography apparatus has means which realizes the pattern writing circuit self-diagnosis method.

Pattern writing circuit self-diagnosis method for charged beam photolithography apparatus and charged beam photolithography apparatus

A writing error diagnosis method for a charged beam photolithography apparatus and a charged beam photolithography apparatus which can specify an error cause within a short period of time in occurrence of a pattern writing error are provided. The writing error diagnosis method for a charged beam photolithography apparatus is a writing error diagnosis method for a charged beam photolithography apparatus which irradiates a charged beam on a target object to write a desired pattern. Processing result data of a pattern writing circuit at a position where a pattern writing error occurs is collected after the pattern writing error occurs, and the collected processing result data of the pattern writing circuit is compared with correct data. The charged beam photolithography apparatus has means which realizes the diagnosis method.

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Shizuoka, Japan

Yujin Handa