Horiba Stec, Co., Ltd.

Screen Holdings Co., Ltd.

Ihara Science Corporation

Yuji Yamaguchi

Tadahiro Yasuda

Tatsuya Hayashi

Kazuhiro Oya

Toshiyuki Himi

Masahiro Kimura

Kentaro Nagai

Masao Yamaguchi

Masayuki Orisaka

Yutaka Yoneda

Miyoshi Kimura

Saki Miyagawa

Akihiro Matsumoto

A substrate processing apparatus according to the invention executes a substrate processing using a supercritical processing fluid. In a processing container, a first introduction port is formed in such a manner as to face space over a substrate in the processing space and a second introduction port is formed in such a manner as to face space under a support tray in the processing space. A first discharge port is formed in such a manner as to face space over the support tray and a second discharge port is formed in such a manner as to face the space under the support tray. The supercritical processing fluid having a higher temperature is supplied into the processing space through the first introduction port, and the supercritical processing fluid having a lower temperature is supplied into the processing space through the second introduction port.

Substrate processing apparatus and substrate processing method

A substrate treating method dries a substrate on a surface of which a predetermined pattern is formed. The substrate treating method includes: a washing step of washing the substrate by immersing the substrate into a washing liquid after the washing liquid is stored into the treating tank in a sealed chamber; a decompression step of decompressing an inside of the chamber; a lifting step of lifting the substrate from the washing liquid stored in the treating tank; a liquid discharge step of discharging the washing liquid from the treating tank; and a hydrophobing step of replacing an atmosphere in the chamber with a hydrophobic agent and performing a hydrophobing treatment on the surface of the substrate.

Substrate treating method and substrate treating device

A gas supply system is provided. The system includes a plurality of component gas supply pipes, a plurality of flow rate control mechanisms for controlling flow rates of the component gases flowing in the component gas supply pipes, and a material gas supply pipe connected with downstream ends of the component gas supply pipes, and connected with one of the gas supply ports at a downstream. The flow rate control mechanism includes flow rate control valves, individual pressure sensors, and fluid resistance elements provided to the component gas supply pipes in this order from upstream, respectively, a common pressure sensor, and controllers for calculating the flow rates of the gases flowing in the component gas supply and controlling the flow rate control valves of the corresponding component gas supply pipes so that the calculated component gas flow rate approaches a predetermined gas flow rate, respectively.

Gas supply system

In a fluid device composed of vertical and horizontal fluid lines, for a purpose of improving a compact size and of assuring ease of assembly, a plurality of vertical fluid lines are arranged in parallel to each other, and in the fluid device where, between the adjoining vertical fluid lines, a plurality of horizontal fluid lines for connecting them are arranged in parallel, one of the horizontal fluid lines connects pipes by using a flange joint to be fastened with a coupling ring, and the other one connects pipes by using joint pipes.

Fluid device

A coupling ring is provided, including a series of unit members with adjacent unit members rotatably coupled to each other, and a fastener coupling unit members on both ends to each other. A concave groove provided to extend circumferentially is externally fitted into an outer circumference of each of two opposing flanges. The unit members on the both ends are coupled to each other by the fastener to be turned into an annular state. The fastener is fastened to thereby press an inclined surface. The flanges are pressure-bonded to each other by forces generated during pressing. A stopper member is provided to restrict a separation angle between the unit member on one end and an adjacent unit member to fall within a certain angle in an open state in which the unit members on the both ends are not coupled to each other provided on at least one of the unit members.

Coupling ring

A diagnostic mechanism includes: a flow rate control part configured to control an opening degree of a flow rate control valve provided in a flow passage so that a measurement flow rate value outputted from a flow rate sensor becomes a target flow rate value; an inspection value output part configured to output an inspection value related to a time integral of the measurement flow rate value in a diagnostic period which is defined in correspondence with a part of a period from a time point of closing the flow passage upstream of the flow rate sensor to a time point of expiration of a state that the measurement flow rate value and the target flow rate value are substantially nearly equal; and a diagnosing part configured to compare the inspection value and a predetermined specified value to diagnose whether an abnormality relating to the flow rate sensor is present.

Diagnostic mechanism

In a mass flow controller verifying system, there are provided a verifying gas line arranged in parallel to influent flow gas lines and joined into a post-confluent flow gas line, a reference volume calculating portion adapted to calculate a reference volume determined for a specified piping of a gas piping system, a verifying parameter calculating portion adapted to calculate a verifying parameter based on time series data of a measurement pressure measured by a pressure measurement unit during a control of a flow rate by a mass flow controller to be verified, and a comparing portion adapted to compare a reference parameter set based on the reference volume and the verifying parameter, whereby the verifying system can be introduced into an existing gas piping system used in a semiconductor manufacturing process and so forth at a low cost and is capable of verifying a mass flow controller quickly and accurately.

Mass flow controller verifying system, verifying method and verifying program

A flow ratio controller having: a main channel; branch channels branching from the end of the main channel; control valves respectively provided in the branch channels; a plurality of flow rate meters for measuring the flow rate of the main channel and the flow rate of each of the branch channels; a valve control section for controlling the control valve provided in one branch channel so that the pressure on the upstream side of the control valve is a given target pressure and, only when the upstream-side pressure is near or not less than the target pressure, starting control of the other control valve so that the flow rate ratios of the branch channels are predetermined ratios; and a target pressure setting section for setting the target pressure such that the smaller the flow volume is in the main channel, the lower is the target pressure.

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Kyoto, Japan

Yuji Yamaguchi