Screen Holdings Co., Ltd.

Yuji Okita

Hideji Naohara

Hiroaki Kakuma

Tatsuya Masui

Toru Endo

Takahiro Yamaguchi

Nobuyuki Shibayama

Masayuki Hayashi

Hiroshi Sano

Yuichi Deba

Katsuei Higashi

Ryuta Tsukahara

Akira Ishimaru

A substrate processing method includes: a holding step of carrying a substrate into an inside of a chamber and holding said substrate; a supply step of supplying a fluid to the substrate on the inside of the chamber; an imaging step of sequentially imaging the inside of the chamber by a camera to acquire image data; a condition setting step of specifying a monitoring target and changing an image condition based on the monitoring target; and a monitoring step of performing a monitoring process on the monitoring target based on the image data having the image condition corresponding to the monitoring target.

Substrate processing method and substrate processing apparatus

A substrate processing method includes a substrate holding step of holding a substrate at a holding position surrounded by a cylindrical guard, a processing liquid supplying step of supplying a processed surface of the substrate with a processing liquid with which the processed surface of the substrate is processed while rotating the substrate held at the holding position about a rotation axis passing through a central portion of the substrate, an image acquiring step of acquiring an image of the processed surface of the substrate and an image of an inner wall surface of the guard while supplying the processing liquid to the processed surface of the substrate, and a detecting step of monitoring luminance values of the images obtained in the image acquiring step, and detecting a processing end time point at which processing of the processed surface of the substrate with the processing liquid is ended.

Substrate treatment method and substrate treatment device

A state detection device includes at least one chuck pin for holding a substrate, a photographing unit configured to photograph the chuck pin, and set at least one image to be obtained as a target image, a matching coordinate calculation unit, namely a data matching calculator, configured to perform matching processing between the target image and a reference image which is at least one image showing the chuck pin, and calculate matching coordinates, which are coordinates indicating a position of the reference image in the target image when a matching score between the reference image and the target image is the highest, and a detection unit, namely a detector, configured to detect an open/closed state of the chuck pin based on the matching coordinates. Therefore, the open/closed state of the chuck pin can be detected while maintaining high detection accuracy.

Substrate holder state detection device and substrate holder state detection method

A substrate processing apparatus that includes a substrate holder, a cup member, an elevating mechanism, a first nozzle, and a camera. The substrate holder holds a substrate and rotates the substrate. The cup member surrounds the outer circumference of the substrate holder. The elevating mechanism moves up the cup member so that the upper end portion of the cup member is located at the upper end position higher than the substrate held by the substrate holder. The first nozzle has a discharge port at a position lower than the upper end position, and discharges first processing liquid from the discharge port to an end portion of the substrate. The camera images an imaging region that includes the first processing liquid discharged from the discharge port of the first nozzle and is viewed from an imaging position above the substrate.

Substrate processing apparatus and substrate processing method

A substrate treatment device is provided, including a substrate holding unit holding a substrate and rotating the substrate; plural nozzles each having a discharge port and discharging a treatment liquid from the discharge port at a treatment position; a camera imaging an imaging region from an imaging position to acquire captured images, the imaging region containing the treatment liquid discharged from the discharge port of each nozzle positioned at the treatment position, and the imaging position being above the substrate held on the substrate holding unit and in a plan view, the imaging position being positioned at a central side of the substrate with respect to the nozzles and at an upstream side in a rotation direction of the substrate holding unit with respect to the nozzles; and an image processing unit determining a discharge state of the treatment liquid based on the captured images.

Substrate treatment device

A substrate treatment method is provided, including: holding a substrate on a substrate holding unit; rotating the substrate holding unit to rotate the substrate; raising a cup member surrounding an outer periphery of the substrate holding unit to locate an upper end of the cup member in an upper end position higher than an upper surface of the substrate held on the substrate holding unit; discharging a treatment liquid from a discharge port of a nozzle located lower than the upper end position to an end portion of the upper surface of the substrate held on the substrate holding unit; an imaging process, acquiring captured images of an imaging region by a camera, wherein the imaging region contains the treatment liquid discharged from the discharge port and is seen from an imaging position above the substrate; and determining a discharge state of the treatment liquid based on the captured images.

In equipment that supplies a processing liquid on a top surface of a substrate while holding the substrate horizontally in a chamber a generation status of fumes is determined. Specifically, an image of a predetermined imaging area in the chamber is captured. Then, the generation status of fumes in the chamber is determined based on luminance values of the captured image acquired by the capturing of an image. Accordingly, it is possible to quantitatively determine whether a generation status of fumes in a chamber is normal.

Fume determination method, substrate processing method, and substrate processing equipment

In equipment that executes a drying process of forming a liquid membrane on a top surface of a substrate W which is held horizontally and gradually enlarging a dry area from which the liquid membrane has been removed, quality of the drying process is determined. Specifically, first, the top surface of the substrate is repeatedly imaged by an imaging unit during execution of the drying process. Then, it is determined whether the dry area is in a normal state based on a plurality of captured images acquired by the imaging. Accordingly, it is possible to quantitatively determine whether a dry area is in a normal state based on a plurality of captured images.

Determination method and substrate processing equipment

A substrate treatment device includes: a substrate rotation part that horizontally holds and rotates a substrate; a nozzle that supplies a treatment liquid to a surface to be treated of the substrate rotated by the substrate rotation part; an imaging part that captures an image of an imaging area including a plurality of target areas in which a liquid film is formed when the treatment liquid is supplied to the substrate; and a detection part that refers to an imaging result of the imaging part and detects a treatment ending time point of each of the target areas based on a change in luminance value for each of the target areas. Further, the imaging area includes at least an area on a center side of the surface to be treated and an area on an outer circumferential side of the surface to be treated as the target areas.

Substrate treatment device and substrate treatment method

Whether or not a liquid is discharged from a nozzle is determined from an image. An index value larger in a discharge state than in a non-discharge state is calculated from an evaluation area including a path of the liquid. The discharge state or the non-discharge state is determined according to a relationship between the index value and a reference value. The reference value is determined according to a histogram of index values obtained from a plurality of images collected in advance. When an evaluation value indicating a peak position or the sharpness of a peak is smaller than a predetermined threshold value in the histogram, the collected images are assumed to show the non-discharge state. When the evaluation value is larger than the threshold value, the collected images are assumed to show the discharge state. Thus, the reference value is set for the discharge state and the non-discharge state.

Discharge determination method and discharge apparatus

A position detection apparatus detects the positions of movable partswhich are movable within processing space SP inside a chamber. An imaging deviceshoots reference sections-, which are disposed inside the chamberand the positions of which are known, and the movable parts and accordingly obtains an original image. An image processorexecutes image processing which is for detecting the movable parts and the reference sections from the original image. An image detectordetects the positions of the movable parts within the processing space in accordance with position information which is indicative of the positions of the movable parts and the reference sections within the original image. It is possible to accurately detect the positions of the movable parts while suppressing the influence exerted by deviation of the imaging device.

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Kyoto, Japan

Yuji Okita