Panasonic Corporation

Panasonic Intellectual Property Management Co., Ltd.

Yuji Nonami

Akio Misaka

Shigeo Irie

Tetsuya Nakamura

Chika Harada

Takehiro Hirai

Hideyuki Arai

Shigeyuki Fujii

Hirofumi Yamada

Yasuko Tabata

Tetsuya Minamide

Ryo Yamaguchi

A first mesh pattern () of a touch sensor () includes first cells () in a diamond shape with an acute angle (A). A second mesh pattern () of the touch sensor () includes second cells () in a square shape. The acute angle (A) ranges from 50° to 65°. One of second thin wires () of each second cell () and the longer diagonal lineof associated one of the first cells () form an angle Aranging from 15° to 75° in a plan view.

Touch sensor

A touch sensor includes a substrate with a first surface, and a plurality of first electrodes on the first surface of the substrate in a view area. The first surface of the substrate includes a plurality of bottomed grooves extending linearly. Each first electrode includes a plurality of fine lines including a conductive material buried in one of the grooves. Each fine line includes a bottomed recess recessed from the first surface toward the bottom surface of each groove.

A semiconductor device includes a circuit portion including at least one real feature, and a plurality of dummy feature groups each including a plurality of dummy features spaced apart from each other by a first distance. The plurality of dummy feature groups are spaced apart from each other by a second distance larger than the first distance, and the circuit portion and the plurality of dummy feature groups are spaced apart from each other by the second distance.

Semiconductor device, mask for fabrication of semiconductor device, and optical proximity correction method

A photomask includes a transparent substrate having a transparent property against exposing light, a semi-light-shielding portion formed on the transparent substrate, a first opening formed in the semi-light-shielding portion and having a first dimension and a second opening formed in the semi-light-shielding portion and having a second dimension lager than the first dimension. A phase-shifting portion which transmits the exposing light in an opposite phase with respect to the first opening is formed on the transparent substrate around the first opening. A light-shielding portion is formed on the transparent substrate around the second opening.

Photomask and pattern formation method using the same

A photomask includes a transparent substrate having a transparent property against exposing light and a halftone portion formed on the transparent substrate. In the halftone portion, a first opening having a first dimension and a second opening having a second dimension larger than the first dimension are formed. A light-shielding portion is formed on the transparent substrate to be disposed around the second opening.

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Kyoto, Japan

Yuji Nonami