Dai Nippon Printing Co., Ltd.

Yuji Machiya

Takahiro Shimizu

Kiyoshi Yamazaki

Hideyuki Nara

Tatsuya Tomita

Syogo Narukawa

Yuichi Kintaka

Yasuo Jimbo

A photomask with a dummy pattern is inspected in a predetermined detection sensitivity by using photomask pattern data designating a photomask with a dummy pattern to detect defects in the photomask. Coordinates indicating the positions of the defects are also determined. The defects in a design pattern area and those in a dummy pattern area are discriminated by using defect-discriminating data. The defects in the design pattern area and those in the dummy pattern area are examined on the basis of respective inspection specifications.

Photomask inspecting method

An IC element layout data displaying system includes a magnetic disk unit for storing IC element layout data, and a preprocessor capable of reading the IC element layout data from the magnetic disk unit, of dividing the IC element layout data into a plurality of pattern sets each having an optional number of successive pieces of graphic information on the basis of the IC element layout data in the IC element layout data, and of generating map information including position information representing respective positions of pattern sets. A pattern retrieving unit accesses the IC element layout data by using the map information generated by the preprocessor to obtain graphic information corresponding a display area specified by an input unit. A display unit displays the graphic information retrieved by the pattern retrieving unit.

IC element layout data display system

System for managing LSI design part data

Growing community of inventors

Shinjuku-ku, Japan

Yuji Machiya