Furukawa Co., Ltd.

Yuichi Yaguchi

Masashi Mizuta

Yutaka Nishikori

Yoshitaka Sakairi

Haruo Sunakawa

A method of producing an inorganic material (S) according to the present invention includes a vitrification step (S) of applying shearing stress and compressive stress to a mixed powder (MP) of a plurality of kinds of inorganic compound powders by using a ring ball mill mechanism () to vitrify at least a part of the mixed powder (MP); and a dispersion step (S) of dispersing the vitrified mixed powder (MP) after the vitrification step (S), where a combined step of the vitrification step (S) and the dispersion step (S) is performed a plurality of times to obtain a vitrified inorganic material powder from the mixed powder.

Method of producing inorganic material and apparatus of producing inorganic material

A method for washing a semiconductor manufacturing apparatus component, the method comprising: a first process of disposing a semiconductor manufacturing apparatus component, to which a nitride semiconductor adheres, in a component holding portion inside a reaction tank of a washing apparatus; a second process of introducing a halogen-containing gas from a gas introducing pipe into the reaction tank to remove the nitride semiconductor adhered to the semiconductor manufacturing apparatus component; a third process of trapping a reaction product generated by a reaction of the halogen-containing gas and the nitride semiconductor in a trapping unit; and a fourth process of discharging the reaction product trapped by the trapping unit from a gas discharging pipe to outside of the reaction tank.

Method for washing semiconductor manufacturing apparatus component, apparatus for washing semiconductor manufacturing apparatus component, and vapor phase growth apparatus

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Tochigi, Japan

Yuichi Yaguchi