Tokin Corporation

Yuichi Tokano

Takanobu Tanabe

Ryoji Muramatsu

Tsugio Takeda

Michikazu Kondo

An electric field sensor comprises a substrate 4, an incident optical waveguide 5 formed on the substrate 4, two branched optical waveguides 6 formed on the substrate 4 to be branched from the incident optical waveguide 5 and having refractive indexes, which are variable in response to an electric field intensity applied thereto, an outgoing optical waveguide 7 formed on the substrate 4 to join the branched optical waveguides 6, and an electric field shielding member 8 formed in the vicinity of a part of the branched optical waveguides 6 for shielding an electric field. The substrate 4 may be provided with a reflection mirror 16 for reflecting light beams from the branched optical waveguides 6. The substrate 4 is made of a ferroelectric material and has polarization directions reverse to each other at portions where the two branched optical waveguides 6 are formed.

Electric field sensor having sensor head with unbalanced electric field

A system comprises a substrate 4, an incident optical waveguide 5 formed on the substrate for receiving a light beam incident thereto, two phase-shift optical waveguides 6 formed on the substrate 4 to be branched from the incident optical waveguide 4 for varying a phase of a transmitted light beam in response to an electric field intensity, an outgoing optical waveguide 7 formed on the substrate 4 to join the phase-shift optical waveguides 6. At least one of the phase-shift optical waveguides 6 has a reversely polarized portion 8 reversely polarized. A light transmission film may be formed at one or a plurality of portions on the phase-shift optical waveguides 6. A buffer layer 14 may be formed on a part on or in the vicinity of the phase-shift optical waveguides 6. A transparent substance film for imparting a stress to one of the phase-shift optical waveguides 6 may be formed on a part or a whole of a portion without the buffer layer 14. A stress imparting member may be formed to impart a stress to a part of one of the phase-shift optical waveguides 6. A light irradiation unit 26 may be formed to irradiate a light beam onto a part or a whole of one of the phase-shift optical waveguides 6.

Optical modulation system

Optical electric field sensor using optical component having

Electric field sensor

Growing community of inventors

Sendai, Japan

Yuichi Tokano