Hitachi, Ltd.

Hitachi-high-technologies Corporation

Hitachi High-tech Corporation

Yuichi Sakurai

Tadanobu Toba

Katsunori Hirano

Masashi Watanabe

Masayoshi Takahashi

Shigeru Kawamata

Yoshinobu Hoshino

Hideo Sakai

Shuji Kikuchi

Masaaki Maeda

Masato Kamio

Yasuyuki Mimatsu

Hideki Osaka

Kazuaki Suzuki

Wen Zheng Li

Shigeyasu Tsubaki

Kazuyuki Tashiro

Ryota Higashi

Ken Iizumi

Shuichi Nishino

The progress of deterioration of a manufacturing facility is prevented while keeping KPI within an allowable range. A facility diagnosis device includes a deterioration prevention mode definition storage unit that stores information including an operation control method for preventing deterioration of a manufacturing facility or a portion thereof for each of predetermined deterioration prevention modes; a KPI calculation unit that calculates a predetermined KPI by using a deterioration degree predicted for each of the deterioration prevention modes for the manufacturing facility or the portion of the manufacturing facility, and determines whether the KPI satisfies a predetermined condition; a deterioration prevention determination unit that determines a deterioration prevention mode that should be executed from a satisfaction determination result; and a control information output unit that outputs control information on the manufacturing facility or the portion of the manufacturing facility according to the deterioration prevention mode that should be executed.

Facility diagnosis device and facility diagnosis method

The work support device stores information indicating a work order for each process, and information indicating a work area of a worker for each work in the process. A processor executes a specifying processing in which a target work to be performed by the worker is specified based on the information indicating the work order, a selection processing in which a target area where the target work specified by the specifying processing to be performed by the worker is selected based on the information indicating the work area, an identification processing in which a work performed by the worker is identified based on image data from a camera that captures an image of the area selected by the selection processing, a determination processing in which whether the worker has deviated from the work order is determined based on an identification result by the identification processing.

Work support device, work support method, and work support program

A device includes a catalog storage unit that stores a catalog having versatility; a catalog control unit that specifies the catalog corresponding to a target machine tool to be subjected to state determination based on machine tool information including an item of facility type and acquires the catalog from the catalog storage unit; a feature quantity extraction unit that extracts a feature quantity from sensor data detected from the target machine tool; a sensor data processing unit that performs state determination of the target machine tool based on the feature quantity distribution included in the acquired catalog and the feature quantity extracted from the sensor data; a feature quantity tuning unit that performs tuning of the feature quantity distribution by mapping the extracted feature quantity to the feature quantity distribution; and a catalog updating unit that updates the catalog based on the feature quantity distribution after tuning.

Facility state determination device, facility state determination method, and facility management system

A state identification device includes: a feature amount extraction unit that extracts a feature amount from physical data of a machine tool unit which shifts to a plurality of operation states; a feature amount storage unit in which a region is provided as a storage destination of the extracted feature amount for each of the plurality of operation states to which the machine tool unit shifts; a similarity calculation unit that calculates a similarity between the extracted feature amount and a feature amount stored in the feature amount storage unit; a state determination unit that determines an operation state of the machine tool unit based on the calculated similarity; and a storage destination determination unit that determines the region serving as the storage destination of the extracted feature amount based on a determination result of the state determination unit.

State identification device, state identification method and mechanical device

There is provided a charged particle beam device which includes a charged particle beam source, a charged particle beam optical system that irradiates a sample with a charged particle beam from the charged particle beam source, a detector that detects a secondary signal generated from the sample by irradiation with the charged particle beam, and an image processing unit that executes integration processing of image data obtained from the secondary signal and outputting an integrated image, and in which the image processing unit executes a normalization integration computation of outputting an integrated image in which a luminance value of the integrated image is always '1' in an integration process.

Charged particle beam device and image processing method in charged particle beam device

Provided is a data processing device with which, when a temporary network congestion occurs, it is possible to avoid a buffer overflow and sustain a process. When a request for retransmission of the same data with respect to a processor element from a buffer occurs continuously a prescribed number of iterations, a data processing device according to the present invention determines that it is possible that a buffer overflow occurs, and suppresses an increase in the volume of data which is accumulated in the buffer (see FIG.).

Data processing device, semiconductor external view inspection device, and data volume increase alleviation method

When an inspection apparatus of a semiconductor device repeatedly executes computation of prescribed area data, such as image processing for detecting defects, procedures for commanding, data load, computation, and data store need to be repeated the number of times of the computation. This may impose a limitation on the speeding up of the operation. In addition, when performing parallel computation by a high-capacity image processing system for handling minute images, a lot of processors are needed, resulting in an increase in cost. In order to solve the above-mentioned problems, in the invention, an inspection apparatus of a semiconductor device includes a data memory including an access section which is capable of reading and writing simultaneously, a plurality of numerical computation units, a connector for connecting the data memory and the numerical computation units, a controller for collectively controlling the contents of processing by the plurality of numerical computation units, another connector for connecting the numerical computation units and the controller, and a data transfer controller for controlling data transfer between the numerical computation units.

Method and apparatus for inspecting defects of semiconductor device

A semiconductor inspecting apparatus includes: a buffer memory whose width is matched to the greater of parallel bus width and the width of the number of serial lanes; a preceding stage bus switching unit that fills the buffer memory with input data without making a free space; equivalent transmission capacity conversion including a following stage bus switching unit that fills read data to the width of an arbitrary number of serial lanes without making a free space; a preceding stage bus switching unit that fills a buffer memory with input data without making a free space; and equivalent transmission capacity inverse conversion including a following stage bus switching unit that fills a parallel bus of arbitrary width with data read from a buffer memory without making a free space.

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Tokyo, Japan

Yuichi Sakurai