Proterial, Ltd.

Kurita Water Industries Ltd.

Hitachi Industrial Equipment Systems Co., Ltd.

Yuichi Ogawa

Yasuo Kuriyama

Kouhei Miyano

Haruyoshi Yamakawa

Motoki Ohta

Kazuyuki Fukui

Masamu Naoe

Naoki Itoh

Yoshihito Yoshizawa

Wataru Sugita

Koji Yamashita

Takahiro Shiratake

Yoshihito c/o Hitachi Metals Ltd Yoshizawa

A multilayer magnetic sheet comprises laminate substrates. Each of the laminate substrates is formed in a band shape having a short side and a long side and comprises magnetic strips stacked in layers. The laminate substrates are aligned and arranged in a plate shape in a direction, in which the long sides are adjacent to each other and the short sides extend. The laminate substrates aligned and arranged in the plate shape are stacked in layers in a thickness direction of the laminate substrates. Long side portions of the laminate substrates including the long sides and vicinities of the long sides overlap each other.

Multilayer magnetic sheet

Provided is a sheet-shaped magnetic member. The sheet-shaped magnetic member comprises magnetic ribbons with anisotropy, and includes a first group, a second group, and a third group. The third group is arranged so that a direction of anisotropy of the magnetic ribbons is along a direction different from both a direction of anisotropy of the first group and a direction of anisotropy of the second group. The first group, the second group, and the third group are arranged next to each other.

Sheet-shaped magnetic member

Dilute chemical solution production device () has a plunger pump and a chemical solution supply pipe () that supply a chemical solution S from a chemical solution reservoir. The end of the chemical solution supply pipe () serves as an injection pointfor the chemical solution (S). The chemical solution supply pipe () is inserted to an approximately central position in the radial direction of an ultrapure water passage (), which is a first pipe, via a bore-through joint (). Conductivity meter () as a conductivity measuring meter is provided on the downstream side of the bore-through joint (), which serves as the injection point (), and is connected to a controller so that the plunger pump () can be controlled in accordance with the measured value of the conductivity meter ().

Dilute chemical solution production device

A multilayer magnetic sheet includes at least one first layer in which a plurality of magnetic strips are arranged side by side; at least one second layer in which the plurality of magnetic strips are arranged side by side, a direction of the long side of the at least one second layer intersecting that of the at least one first layer; and at least one third layer in which the plurality of magnetic strips are arranged side by side, a direction of the long side of the at least one third layer being the same as that of the at least one first layer. A position of the long side in the at least one first layer and a position of the long side in the at least one third layer are separated from each other by 0.5 mm or more in a direction in which the short side extends.

The soft magnetic alloy of the present disclosure is represented by a composition formula of FeSiBCuMwhere M is at least one type of element selected from a group consisting of Nb, Mo, V, Zr, Hf, and W, and the formula satisfies 82.5&#x2264;a&#x2264;86, 0.3&#x2264;b&#x2264;3, 12.5&#x2264;c&#x2264;15.0, 0.05&#x2264;d&#x2264;0.9, and 0&#x2264;e&#x3c;0.4 in at %. The soft magnetic alloy includes a structure that has a crystal grain with a grain diameter of 60 nm or less in an amorphous phase.

Soft magnetic alloy, soft magnetic alloy ribbon, method of manufacturing soft magnetic alloy ribbon, magnetic core, and component

A cleaning method including a persulphuric acid producing step of causing a cleaning sulfuric acid solution to travel into an electrolyzing section and to circulate therethrough to produce persulphuric acid having a predetermined concentration by electrolysis in the electrolyzing section, a solution mixing step of mixing the sulfuric acid solution containing the persulphuric acid produced in the persulphuric acid producing step with a halide solution containing one or more types of halide ion without causing the solutions to travel into the electrolyzing section to produce a mixed solution having a post-mixture concentration of oxidant including the persulphuric acid that ranges from 0.001 to 2 mol/L, a heating step of heating the mixed solution, and a cleaning step of cleaning a semiconductor substrate by transporting the heated mixed solution to cause the heated mixed solution to come into contact with the semiconductor substrate.

Method and system for cleaning semiconductor substrate

The present invention relates to a method and a system for cleaning a semiconductor substrate wherein Al is at last partially exposed on a silicon substrate and silicided with a metallic substance without damaging the Al and a silicide layer. A cleaning portion cleans the aforementioned semiconductor substrate. A delivery portion, disposed on the cleaning portion, delivers a solution to the semiconductor substrate. A sulfuric acid solution transfer path connected onto the delivery portion transfers a sulfuric acid solution and an adsorptive inhibitor solution transfer path connected to the delivery path transfers an adsorptive inhibitor having any one or more of N-based, S-based, and P-based polar groups to the delivery portion. The sulfuric acid solution and the adsorptive inhibitor may be mixed or separately transferred to come into contact with the semiconductor substrate.

Semiconductor substrate cleaning method and cleaning system

This method of producing an amorphous transformer for electric power supply comprises forming and shaping an iron core by laminating amorphous alloy thin bands and forming a winding, subjecting the iron core, after forming and shaping, to an annealing treatment in which a temperature of a center portion of the iron core during annealing is 300 to 340&#xb0; C. and a holding time is not less than 0.5 hr, and applying a magnetic field having a strength of not less than 800 A/m to the iron core while subjecting the iron core, after forming and shaping, to the annealing treatment.

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Tokyo, Japan

Yuichi Ogawa