Canon Kabushiki Kaisha

Nissan Motor Company Limited

Hitachi, Ltd.

Renault S.a.s.

Other

Oiles Corporation

Yuichi Iwasaki

Tetsuya Hayashi

Noriyasu Hasegawa

Masato Muraki

Yoshinori Nakayama

Yoshimasa Araki

Kenji Tamamori

Masayoshi Esashi

Kouji Asano

Yoshiaki Moro

Shinichi Hashimoto

Ichiro Tanaka

Wei Ni

Toshiharu Marui

Keiichiro Numakura

Nobuto Kawahara

Akinori Okubo

Taku Shimomura

Hideki Ina

Akiyoshi Suzuki

Kenji Saitoh

Mitsuru Miyazaki

Shigeharu Yamagami

Hideki Matsumoto

Mitsuro Sugita

Satoru Oishi

Miyoko Kawashima

Ikuo Shimoda

Ryota Tanaka

Makoto Ogusu

Yutaka Mita

Takahiro Hosokawa

Yasuaki Hayami

Yosuke Tomita

Daiki Sato

Sari Ito

Ryouta Tanaka

Yoshinori c/o Hitachi Ltd Ipg Nakayama

A liquid discharge apparatus has a storage portion configured to store a discharged material, a discharge port configured to communicate with the storage portion and discharge the discharged material stored in the storage portion, and a pressure control device configured to control a pressure of the discharged material stored in the storage portion. The pressure control device controls the pressure of the discharged material to shift from a first negative pressure state, to a second negative pressure state of a greater negative pressure than the first negative pressure state, and then to a third positive pressure state.

Liquid discharge apparatus and imprint apparatus

A semiconductor device includes: a drift region that is arranged on a main surface of a substrate, and has a higher impurity concentration than the substrate; a first well region that is connected to the drift region; and a second well region that is arranged adjacent to the first well region and faces the drift region. The second well region has a higher impurity concentration than the first well region. A distance between the source region that faces the drift region via the first well region and the drift region is greater than a distance between the second well region and the drift region, in a direction parallel to the main surface of the substrate. A depletion layer extending from the second well region reaches the drift region.

Semiconductor device and manufacturing method thereof

A semiconductor device includes: a substrate; a source region formed on a main surface of the substrate; a well region electrically connected to the source region; a drift region in contact with the well region; a drain region in contact with the drift region; a first electrode electrically connected to the source region; a second electrode electrically connected to the drain region; a third electrode formed in contact with the source region, the well region, and the drift region through an insulating film; and a parasitic capacitance reduction region formed in contact with the source region and in contact with the third electrode through the insulating film and having a higher resistance value than that of the source region.

Semiconductor device and method for manufacturing same

A storage device stores an ejection cartridge including an accommodating container that accommodates an ejection material, and an ejection head that includes an ejection port for ejecting the ejection material accommodated in the accommodating container. The storage device includes a mount on which the ejection cartridge is mounted, and includes a pressure regulating tank configured to control a pressure of an inside of the accommodating container of the ejection cartridge fixed to the mount with its ejection port not enclosed.

Storage device, ejection-material ejection device, and imprint apparatus

An ejection-material ejection apparatus and an imprinting apparatus are provided which are capable of quickly detecting damage of a flexible membrane and avoiding contact between an ejection material and an operating liquid even if part of the flexible membrane is damaged. The flexible membrane includes a first film () covering a first storing space () for the ejection material, a second film () covering a second storing space () for the operating liquid, and an inter-film spacesituated between the first film () and the second film (). A change in state of the inter-film space () resulting from communication between at least one of the first storing space () and the second storing space () and the inter-film space () is detected with a liquid sensor (), a flow speed sensor (), and a liquid leakage sensor ().

Ejection-material ejection apparatus and imprinting apparatus

An ejection material filling device fills an ejection material into a first storage space of an ejection material ejecting device including an ejection head configured to eject the ejection material and a storage container having an internal space separated by flexible membrane into the first storage space storing the ejection material and a second storage space storing a hydraulic fluid. The ejection material filling device includes an ejection material server bottle storing the ejection material to be filled into the first storage space, pipes configured to form a circulation path including the ejection material server bottle and the first storage space, a pump configured to circulate the ejection material through the circulation path, and a particle filter provided in the circulation path.

Ejection material filling device, pressure regulation device, and ejection material filling method

The present disclosure includes a drive circuit (-) for switching a switching element, and a variable capacity circuit (A), connected between a control terminal (G) of the switching element and the drive circuit (-), capable of switching at least between a first capacity value and a second capacity value different from the first capacity value, and controls a capacity value between the control terminal and the drive circuit via the variable capacity circuit.

Switching device and method for controlling switching device

The internal space of a storing container is separated by a flexible membrane into a first storing space storing an ejection material and a second storing space storing an operating liquid. A change in electrical property of the flexible membrane resulting from entry of at least one of the ejection material and the operating liquid to the inside of the flexible membrane is detected.

A drive device wherein a main switching element is connected to a main current path, an input terminal of the switching element on the higher potential side and an output terminal of the switching element on the lower potential side are electrically connected to a control terminal of the main switching element, a first resistance is connected between an input terminal of the switching element on the lower potential side and a control terminal of the main switching element, a first capacitor is parallelly connected to the first resistance, and a second capacitor is connected between a connection point of the first resistance and a control terminal of the main switching element and a terminal on the higher potential side of the main switching element.

Drive device

The present invention provides a lithography apparatus including a plurality of detectors each configured to detect a mark on the substrate, and a controller configured to control a patterning so that a first operation and a second operation are alternately performed, the first operation irradiating the substrate with a beam while scan movement of the substrate is performed in a first direction, the second operation performing step movement of the substrate in a second direction different from the first direction, wherein the controller is configured to cause, in the first operation, at least one of the plurality of detectors to detect the mark, and the plurality of detectors are arranged, in the second direction, at an interval which is a positive integer multiple of a distance of the step movement.

Lithography apparatus, and method of manufacturing article

An active dynamic vibration absorberincludes a weight; a framewhich is adjacent to the weightin such a manner as to surround the weightwith clearances Xand Y; a holding mechanismwhich is interposed between the weightand the frameand holds the weightmovably in an X direction with respect to the frame, while holding the weightimmovably in a Y direction and a vertical direction V; a detecting meansfor detecting the relative vibration of a predetermined value in the X direction of the weightwith respect to the frame; and a moving meansfor relatively moving the weightin the X direction with respect to the frameon the basis of a detection signal from the detecting meanssuch that the relative movement of the weightin the X direction with respect to the frameis allowed, while the vibrational displacement of the weightin the X direction with respect to the frameis reduced.

Active dynamic vibration absorber

An exposure apparatus () configured to expose a pattern of a reticle () via a liquid (LW) filled between a final lens of a projection optical system () and a substrate () includes a stage () configured to drive the substrate, a shield () configured to enclose the stage so as to form a shield space (SS) around the stage, the shield having an opening for an import or an export of the substrate, and a unit, such as a load lock chamber (), configured to prevent a vapor of the liquid to going out of the shield space and to reduce an outflow amount of the vapor.

Exposure apparatus

An immersion exposure apparatus which exposes a substrate through a liquid includes an illumination optical system, a projection optical system, a chuck, a liquid support plate, a stage, and a liquid repellency recovery unit. The illumination optical system illuminates an original with exposure light from exposure light sources. The projection optical system projects a pattern of the original onto the substrate. The chuck holds the substrate. The liquid support plate supports a liquid together with the substrate held by the chuck. A surface of the liquid support plate includes a surface of a metal oxide. The stage is provided with a chuck and the liquid support plate and is movable. The liquid repellency recovery unit is configured to recover the liquid repellency of the surface of the metal oxide with regard to the liquid.

Immersion exposure apparatus and device manufacturing method

An exposure apparatus for exposing a pattern of a reticle onto a substrate includes a projection optical system for projecting the pattern onto a substrate, the exposure apparatus exposing the substrate through a flammable liquid that is filled in a space between the substrate and a final lens of the projection optical system closest to the substrate, and an explosion-proof unit for shielding an ignition source that can ignite the liquid or vapor of the liquid, from the liquid and the vapor.

A deflector which deflects a charged particle beam includes a substrate having an opening through which the charged particle beam should pass, and a deflection electrode which is arranged in the opening to deflect the charged particle beam and has a first conductive member and second conductive member which are formed by plating. The second conductive member is formed on a surface of the first conductive member and is essentially made of a material that is more difficult to oxidize than the first conductive member.

Growing community of inventors

Utsunomiya, Japan

Yuichi Iwasaki