Dai Nippon Printing Co., Ltd.

Yuichi Inazuki

Katsutoshi Suzuki

Takaharu Nagai

Koji Ichimura

Saburou Harada

Ryugo Hikichi

Takashi Adachi

Nobuhito Toyama

Yasutaka Morikawa

Yasuhisa Kitahata

Takanori Sutou

An imprint method using a mold and/or a transfer substrate having a mesa structure includes a resin supply step, a contact step, a curing step, and a mold release step. In the resin supply step, a balance layer is formed by supplying a molded resin also to an area outside of a pattern formation area of the transfer substrate in which a pattern structure is to be formed.

Imprint method and imprint mold manufacturing method

A photomask which improves the imaging performance that the photomask has and forming a good micro image on a wafer in photolithography with a half pitch of 60 nm or less. Provided is a photomask used for photolithography using an ArF excimer laser as an exposing source for immersion exposure by quadrupole-polarized illumination with a high-NA lens. The photomask includes a mask pattern of a light shielding film or semi-transparent film on a transparent substrate, and further, given that a thickness of the light shielding film or semi-transparent film is 't' nm, a refractive index is 'n', an extinction factor is &#x201c;k&#x201d;, and a bias of a space part of the mask pattern is &#x201c;d&#x201d; nm, when &#x201c;t&#x201d;, &#x201c;d&#x201d;, &#x201c;n&#x201d; and &#x201c;k&#x201d; are adjusted and the photomask is used for the photolithography, optical image contrast takes a value exceeding 0.580.

Photomask

Growing community of inventors

Tokyo, Japan

Yuichi Inazuki