Hitachi, Ltd.

Hitachi Device Engineering Co., Ltd.

Yuichi Hashimoto

Masaru Takabatake

Kikuo Ono

Takahiro Ochiai

Toshiki Kaneko

Masahiro Yanai

Kenichi Onisawa

Kenkichi Suzuki

Minoru Hiroshima

Ryoji Oritsuki

Masaaki Matsuda

Kenichi Cyahara

Hayao Kozai

Kazuhiro Ohhara

Toshikazu Horii

Takashi Isoda

A liquid crystal display device comprising a wiring line of a laminated structure over an insulating substrate. The laminated structure includes a first layer made of a first metal layer, and a second layer formed over the first layer and made of a second metal layer having the same principal component as that of the first metal layer but a different added element and/or a different composition. The first layer has a side end face of a right-tapered shape, whereas the second layer has a side end face set at a right angle or counter-tapered with respect to the substrate face.

Display device having a wiring multi-layered structure with tapered first layer and a manufacturing process for the tapered structure

In a liquid crystal display substrate in which the pixel electrode is applied with a voltage through the drain and source of a thin-film transistor (TFT) that conducts by a voltage applied to the TFT gate electrode, this gate electrode and a busline connected to the gate electrode are formed as a multi-layered structure consisting of a gate layer and at least two layers of a gate insulation film and an amorphous silicon film. The multi-layered structure is formed by etching through a single mask.

Liquid crystal display device having multilayer gate busline composed of

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Mobara, Japan

Yuichi Hashimoto