Shin-etsu Chemical Co., Ltd.

Yuichi Hamada

Meguru Kashida

Yoshihiro Kubota

Yoshihiko Nagata

Toru Shirasaki

Shinichi Sato

Hitoshi Noguchi

Satoshi Kawakami

Sakae Kawaguchi

Hirofumi Kishita

Hiroshi Inomata

Yu Yanase

Kouichi Yamaguchi

Hiroto Sugahara

Kimitaka Kumagae

Akinori Nishimura

Takashi Matsuoka

Tatsuya Sema

Provided is an agglutinant for pellicles that can reduce residues stuck onto an exposure original plate when a pellicle is peeled from the exposure original plate after being used in lithography, and also provided are a pellicle, an exposure original plate with a pellicle, a method for regenerating an exposure original plate, and a peeling residue reduction method.

Agglutinant for pellicle, pellicle, exposure original plate with pellicle, method for producing semiconductor device, method for producing liquid crystal display board, method for regenerating exposure original plate, and peeling residue reduction method

A pellicle frame including a frame base having an anodized film on a surface thereof and covered with a transparent polymer film, where the polymer film is formed without color unevenness, is described. The inside surface of the pellicle frame has reduced glare due to particles and has a light resistance to an ArF laser at 1500 J. A method for manufacturing a semiconductor device using a photomask with the pellicle is also described.

Pellicle frame, pellicle, and method of producing pellicle frame

The present invention relates to a pellicle frame including a frame base, a black anodized film formed on a surface of the frame base and having a thickness of 2.0 to 7.5 &#x3bc;m, and a transparent polymer electrodeposition coating film formed on the anodized film, and a production method thereof; and to a pellicle including the pellicle frame and a pellicle film provided on one end face of the pellicle frame.

To provide a method of separating a pellicle and a device for separating a pellicle which can reduce the amount of residue left on an exposure original plate when the pellicle is separated from the exposure original plate and which can wash again the exposure original plate under mitigated washing conditions, a pellicle frame support pin is inserted into a jig hole provided in an outer surface of the pellicle frame, the pellicle frame support pin is moved in a direction in which the pellicle is separated from the exposure original plate, a separation force applied by the movement to the pellicle frame support pin is measured and the pellicle is separated from the exposure original plate while control is being performed such that the separation force is minimized.

Method of separating pellicle and device for separating pellicle

There is provided a method for procuring an agglutinant structure or in particular an agglutinant layer, from an agglutinant material, which is laid on an end face of a pellicle frame for gluing the pellicle to a photomask, wherein the agglutinant material is processed into the agglutinant layer passing through one more stages wherein the material is under a helium gas atmosphere; the invention is also about a manufacturing method of a pellicle wherein the agglutinant layer is procured in the above described manner.

Method of procuring an agglutinant structure and a method of manufacturing a pellicle including said agglutinant procuring method

There is provided a pellicle frame which prevents particles such as carbon black particles or filler particles from contaminating a photomask even when stray light hits the inside face of the pellicle frame in the exposure step of photolithography. More specifically, provided are a pellicle frame including a frame base, and a polymer coating layer coating at least an inner circumferential surface of the frame base, the polymer coating layer including an outermost polymer layer on a side farthest away from the frame base and one or more inner polymer layers between the frame base and the outermost polymer layer, wherein at least one of the one or more inner polymer layers contains particles, and the outermost polymer layer contains no particles or has a particle concentration lower than a highest particle concentration among the one or more inner polymer layers; and a pellicle including the pellicle frame.

Pellicle frame and pellicle

There is provided a pellicle wherein each edge area where the inner wall of the pellicle frame meets the upper end face or the lower end face, respectively, of the pellicle frame consists not only of the conventional single chamfer face but also of additional attempt(s) to make the edge area virtually rounded, such as additional chamfering(s) or rounding, whereby the edge area is devoid of cracking and scars.

Pellicle

Here is proposed a method for bonding a pellicle to a stencil such as mask plate, which is characteristic in that the stencil-bonding agglutinant layer of the pellicle is warmed under load while the pellicle is being bonded to the stencil, preferably at a temperature in a range of 35 through 80 degrees C., and the load is increased stepwise and with intermittent removal of the load.

Method for bonding a pellicle, and a bonding apparatus used in this method

There is provided a pellicle which comprises a pellicle frame having eight or more jig holes in the outer wall for receiving jig pins of pellicle handling jigs; the jig holes are arranged such that the pellicle frame can be held by two or more pellicle handling jigs at the same time, and preferably the jigs holes are on the outer walls of the all frame bars so that the pellicle frame can be held by the jigs at both the longer frame bars and the shorter frame bars at the same time.

Pellicle frame

There is provided a pellicle kit for manufacturing a pellicle which comprises a pellicle frame having a jig hole in the outer wall of its frame bar and a jig having a jig pin which is adjusted to enter the respective jig hole until the front end of the jig pin is abutted against the tapered bottom face of the jig hole to thereby fix said pellicle frame.

Pellicle kit for manufacturing a pellicle

A method of adhering a lithographic pellicle includes steps of pressing the pellicle frametoward the exposure stencilby a pressure platevia a bagcontaining a low viscosity liquid being mounted on the surface of the pressure platefacing the pellicle frameso as to be along sides of the pellicle frameand face the pellicle frame, the compressively deformable member being easily deformable when a pressure is applied thereonto. According to the thus constituted method of adhering a pellicle, it is possible to uniformize a pressure applied onto an exposure stencilsuch as a photomask, a reticle or the like via a pellicle framewhen a pellicle is adhered onto the exposure stencil

Method of adhering lithographic pellicle and adhering apparatus therefor

A pellicle for lithography is provided that includes a pellicle frame provided with one or more atmospheric pressure adjustment holes having an inner peripheral face with a shape that opens out in going toward the inside of the pellicle frame. There is also provided a process for producing the pellicle for lithography, the process comprising a step of forming the pellicle for lithography and a step of spray-coating a pressure-sensitive adhesive composition from inside the pellicle frame.

Pellicle for lithography

A method for stripping a pellicle from an exposure master plate is provided, the pellicle being a lithographic pellicle that includes a pellicle frame, a pellicle film stretched over one end face of the pellicle frame via a pellicle film adhesive, and an exposure master plate pressure-sensitive adhesion layer provided on the other end face, the method including a step of irradiating the pressure-sensitive adhesion layer with UV light. There is also provided a stripping apparatus used in the stripping method, the apparatus including a light source for irradiating the exposure master plate pressure-sensitive adhesion layer with UV light and means for heating the exposure master plate and/or the pellicle frame with which the pressure-sensitive adhesion layer is in contact.

Method for stripping pellicle and stripping apparatus used therein

A lithographic pellicle is provided that includes a pellicle frame, a pellicle film stretched over one end face of the pellicle frame via a pellicle film adhesive, and an exposure master plate adhesive provided on the other end face, wherein corners formed between a pellicle film adhesion face and exposure master plate adhesion face of the pellicle frame and inside and outside faces of the frame are subjected to C chamfering, and the chamfer dimension on the exposure master plate adhesion face is greater than C0.35 (mm) but no greater than C0.55 (mm).

Growing community of inventors

Annaka, Japan

Yuichi Hamada