Industrial Technology Research Institute

Rohm & Haas Electronic Materials LLC

Yuhsin Tsai

Maria Anna Rzeznik

Martin William Bayes

Philip D Knudsen

Cheng-Hsing Fan

Chi-Yuan Hung

Xuesong Wang

Fu-Yu Tsai

A method for forming a polymerized film on a surface of a non-conductive material and subsequently forming an electroless metal plating film on the surface is described. The method includes the step of contacting the surface of the material with a solution including (A) an amine compound having at least two functional groups, where at least one of the functional groups is an amino group, and (B) an aromatic compound having at least one hydroxyl group on the aromatic ring.

Method for electroless metallization

A random amorphous copolyester is synthesized by using diacid monomers and diol monomers. The random amorphous copolyester has a structure of the formula (I): wherein R, Ris an aromatic or aliphatic monomer, A is 0-0.8, B is 0-0.8, C is 0-1, D is 0-1, E is 0-0.8, F is 0-0.8, C+D&#x3c;0.2 and A+B+E+F&#x3c;0.8. The diacid monomer comprises TPA and an aromatic or aliphatic diacid monomer, the diol monomer comprises EG, 1,3 and 1,4-CHDM, and an aromatic or aliphatic diol monomer.

Random amorphous copolymer and manufacturing method thereof

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Hsinchu, Taiwan

Yuhsin Tsai