Sharp Kabushiki Kaisha Corporation

Sakai Display Products Corporation

Sharp Corporation

Unified Innovative Technology, LLC

Shark Kabushiki Kaisha

Yuhki Kobayashi

Shinichi Kawato

Satoshi Inoue

Takashi Ochi

Katsuhiro Kikuchi

Eiichi Matsumoto

Masahiro Ichihara

Yoshimasa Fujita

Kazuki Matsunaga

Makoto Yamada

Manabu Niboshi

Hidenori Ogata

Ken Okamoto

Kiyoshi Minoura

Yozo Narutaki

Hiroshi Tsuchiya

Shinji Shimada

Katsuhiko Kishimoto

Yuto Tsukamoto

Kohzoh Nakamura

Masahiro Mitani

Takeshi Hirase

Seiichi Mitsui

Hisanori Bessho

Katsumi Kondoh

Mitsuhiro Koden

Kazuo Takizawa

Akiko Iwata

Tohru Sonoda

Tsuyoshi Inoue

Hideki Uchida

Emi Yamamoto

Satoshi Shibata

Takeshi Ishida

Eiji Koike

Yoshiyuki Isomura

Kazuya Ishida

Tooru Sonoda

Masahito Ohe

In the present embodiment, a sealing agent () sealing two substates contains a low melting-point glass material and is adhered to each of a first substrate () and a second substrate (), a barrier rib (), which is formed in such a manner as to surround the outer periphery of an electronic element (), is disposed between the sealing agent () and the electronic element (), and between the first substrate () and the second substrate (), and the sealing agent () is spaced apart from the barrier rib (). As a result, a deterioration of the electronic element, caused by the heat produced when sealing, may be prevented while the electronic element formed between the two substrates is protected from moisture and oxygen.

Substrate sealing structure body, and, display device and production method therefor

A display device includes a first substrate including a light-emitting element that is an upward light emission type and a transistor in a lower layer than the light-emitting element, a second substrate facing the first substrate, and a liquid crystal layer disposed between the first substrate and the second substrate. The first substrate includes a sealing film formed in an island shape and covering the light-emitting element and a pixel electrode that is transparent. The pixel electrode includes a first portion not overlapping the sealing film and a second portion overlapping the sealing film.

Display device

A reflective liquid crystal display device () including a reflection electrode (), a liquid crystal layer (), and a counter electrode () is formed above an insulating layer () in a first region (R) of a TFT substrate (). An organic EL display device () including a first electrode (), an organic layer (), and a second electrode () is formed on the insulating layer () of the TFT substrate () in a second region (T). A coating layer () is formed at least on a surface of the organic EL display device () so as to wrap the second electrode () and the organic layer () of the organic EL display device (). A part of the coating layer () is in contact with the insulating layer (). As a result, a complex display apparatus capable of preventing the organic layer from deteriorating and excellent in reliability can be obtained.

Display apparatus

A display device includes a first substrate including a light-emitting element that is an upward light emission type and a transistor in a lower layer than the light-emitting element, a second substrate facing the first substrate, and a liquid crystal layer disposed between the first substrate and the second substrate. The first substrate includes a sealing film formed in an island shape and covering the light-emitting element, a pixel electrode including a first portion not overlapping the sealing film, and a light reflective film overlapping the first portion and including a recessed and protruded surface.

A blue fluorescent light-emitting layer is provided in common for a subpixel and a subpixel, a green fluorescent light-emitting layer is provided in common for the subpixel and a subpixel, and a red light-emitting layer is provided in common for the subpixel and a subpixel. An opposing surface distance is less than or equal to a F&#xf6;rster radius, and in the subpixel, the green fluorescent light-emitting layer and the red light-emitting layer are layered with a separation layer interposed therebetween.

Display device and manufacturing method therefor

To provide a vapor deposition source of which material usage efficiency is higher as compared with the related art. A vapor deposition source () includes a vapor deposition particles ejecting unit () configured to include multistage of nozzle units layered apart from each other in a vertical direction, each of the nozzle units including at least one vapor deposition nozzle (), and at least one space part () provided between the multistage of vapor deposition nozzles, and a vacuum exhaust unit () connected with the at least one space part ().

Vapor deposition source and vapor deposition device for producing vapor deposition film with high material usage efficiency

A vapor deposition mask including a metallic substrate provided with a plurality of openings for passing vapor deposition particles, wherein at least a portion of the plurality of openings are structured by one or more opening groups in which the plurality of openings are repeatedly arranged in accordance with a constant rule, and a plurality of protrusions of identical height are arranged to support the entire substrate from one side, and are provided only outside the opening group formation region.

Vapor deposition mask and manufacturing method for organic EL display device

Included are first light-emitting element including a first organic layer having an island shape, and a first lower electrode, an electrode cover film having an insulating property and covering an edge of the first lower electrode, and a second light-emitting element including a second organic layer that has an island shape and that is an identical layer to the first organic layer, and a second lower electrode. As an opening of the electrode cover film wholly overlaps with the first lower electrode and the first organic layer, so that the opening defines a light-emitting region of the first light-emitting elements. When the edge of the second organic layer overlaps with the second lower electrode without being interposed with an insulating film, the edge of the second organic layer defines a light-emitting region of the second light-emitting element.

A blue fluorescent light-emitting layer is provided in common for first and second subpixels, a green fluorescent light-emitting layer is provided in common for second and third subpixels, and a red light-emitting layer is provided in common for the second and fourth subpixels. In the second subpixel, an opposing surface distance is less than or equal to a F&#xf6;rster radius, and at least of the blue fluorescent light-emitting layer and the green fluorescent light-emitting layer are layered with the red light-emitting layer with a separation layer interposed therebetween.

Provided is a line source that can achieve uniform film thickness distribution and also achieve high use efficiency of vapor deposition materials. A line source () has slit nozzles () having a slit nozzle's length-to-width ratio of 4 to 50, a width of 1 mm to 5 mm, and a depth of 5 mm to 20 mm.

Vapor deposition source, vapor deposition apparatus and method for producing vapor-deposited film

In this manufacturing method, in a blue fluorescent light-emitting layer formation step, a blue fluorescent light-emitting layer is formed in both a subpixel and a subpixel; in a green fluorescent light-emitting layer formation step, a green fluorescent light-emitting layer is formed in both the subpixel and a subpixel; and in a red light-emitting layer formation step, a red light-emitting layer is formed in both the subpixel and a subpixel. In at least two of the abovementioned steps, linear vapor deposition is performed using a slit mask having an opening that is provided so as to extend across a plurality of pixels.

Display device manufacturing method, and display device

It comprises: a film made of a resin in which an aperture pattern is formed, the aperture pattern passing through the film, the aperture being with a shape and dimension corresponding to the thin-film pattern in a pre-established region for formation of the thin-film pattern on the substrate; and a metal member that has an aperture part opposite the aperture pattern with a shape and dimension larger than the aperture pattern, the metal member being provided as a thin sheet in intimate contact with one surface of the film on an outside part of the aperture pattern of the film. The film is mutually distanced and distributed, at a position where the film does not overlap the aperture pattern, into a plurality of divided parts on one surface of the metal member.

Deposition mask and manufacturing method

The present invention provides a vapor deposition device including a novel alignment mechanism applicable to a large substrate, a vapor deposition method, and a method for manufacturing an organic electroluminescence element. The vapor deposition device of the present invention is a vapor deposition device for performing vapor deposition while transporting a substrate in a first direction, and includes: a mask; a substrate tray including a substrate-holding portion and a guide portion protruding from the substrate-holding portion to the mask side and disposed along the first direction; at least one distance meter disposed on a first end which is one end of the mask or the guide portion; and at least one driver coupled with a second end which is the other end of the mask. The at least one distance meter is configured to measure a distance between the at least one distance meter and the guide portion or the first end when the guide portion faces the first end. The at least one driver is capable of driving the mask in a second direction perpendicular to the first direction based on the measured value of the at least one distance meter.

Vapor deposition device, vapor deposition method, and method for manufacturing organic electroluminescence element

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Osaka, Japan

Yuhki Kobayashi