Taiwan Semiconductor Manufacturing Comp. Ltd.

Yuh-Fong Hwang

Chen-Yu Chang

Wen-Yao Chen

Chiech-Yi Kuo

A method for controlling mask fabrication is provided, wherein the method uses statistical process control analysis. A manufacturing model is defined. A process run of a mask is performed as defined by the manufacturing model. A fault detection analysis is performed to reduce a bias in the manufacturing model. A fine-tuning signal is generated in response to a result of the fault detection analysis. The process run operation is adjusted according to the fine-tuning signal.

Method and system for mask fabrication process control

A mask fabrication system. The mask fabrication system contains a processing tool, a metrology tool, and a controller. The processing tool processes a mask. The metrology tool inspects the mask to obtain an inspection result. The controller generates a manufacturing model of the processing tool and calibrates the manufacturing model according to a device data, a material data, and the inspection result of the mask.

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Hsinchu, Taiwan

Yuh-Fong Hwang