Boe Technology Group Co., Ltd.

Beijing Boe Display Technology Co., Ltd.

Fuzhou Boe Optoelectronics Technology Co., Ltd.

Beijing Boe Technology Development Co., Ltd.

Yuchun Feng

Huibin Guo

Shoukun Wang

Liangliang Li

Zongjie Guo

Xi Chen

Xiaowei Liu

Jianfeng Yuan

Zheng Liu

Jing Wang

Bo Wang

Qian Zhang

Lin Li

Zhenyu Zhang

Cong Liu

Yao Liu

Linlin Wang

Xiaoxiang Zhang

Tsungchieh Kuo

Tsung Chieh Kuo

Jinliang Wang

Zhaohui Hao

Chen Lin

Ting Cui

Tsung-Chieh Kuo

Moli Sun

Shanshan Yang

Yunjin Chen

Chunze Zhang

Bin Yue

Yisong Ruan

Shujuan Li

Zhangxiang Huang

Liangzhen Lin

The present disclosure provides a display panel including a substrate, an organic electroluminescent device, and an absorbing layer, wherein the organic electroluminescent device is arranged on the substrate, and the absorbing layer covers the organic electroluminescent device and the substrate. The absorbing layer includes an oxygen absorbing layer and a photocatalytic layer for catalyzing water decomposition, the photocatalytic layer covers the organic electroluminescent device and the substrate around the organic electroluminescent device, and the oxygen absorbing layer is covered on the photocatalytic layer and the substrate around the photocatalytic layer.

Display panel, display device and manufacturing method thereof

A display substrate includes: a base substrate, as well as a first metal layer, a first insulating layer, a second metal layer, a second insulating layer, and a common electrode metal layer laminated on one side of the base substrate. The common electrode metal layer includes metal line segments and connecting line segments. The metal line segments include first metal line segments and second metal line segments. The connecting line segments connect the adjacent first and second metal line segments. Each connecting line segment is provided with a maintenance line segment. Orthographic projections of the maintenance line segments on the base substrate do not overlap those of gate lines and data lines on the base substrate. The spacing between the orthographic projections of the maintenance line segments and those of the gate lines and data lines is greater than or equal to a preset distance, which is greater than zero.

Method for maintaining display panel, display substrate, and display device

The present invention provides an array substrate comprising a substrate, a metal conductive film layer, and an anti-reflective film layer located between the substrate and the metal conductive film layer, and a method for manufacturing the same, as well as a display device. The method comprises step S1: forming an anti-reflective film layer on a substrate by adjusting the reaction power and/or reactive gas flow during the formation of film by the chemical vapor deposition process; and step S2: forming a metal conductive film layer on the substrate finished in step S1. Through the preparation method of the array substrate, the anti-reflective film layer can have a sand-like granulation structure, such that light reflected from the metal conductive film layer can be blocked, thereby weakening or avoiding the light reflected from the surface of the metal conductive film layer, further improving the display effect of the array substrate.

Preparation method for array substrate

An array substrate, a display device, and a method for manufacturing the array substrate are disclosed. The array substrate includes a base substrate and a pixel array structure disposed on the base substrate, the pixel array structure includes at least one light shielding layer made of a light shielding material, and the light shielding material can prevent light leakage or light reflection, thereby increasing an opening ratio of the display device.

Array substrate, display device and manufacturing method for the array substrate

This present disclosure provides an array substrate, a manufacturing method thereof, and a display apparatus, aiming at solving the issue of light reflection on the array substrates and improving the display effects of display apparatuses. The array substrate includes a transparent substrate; a plurality of components disposed on a first side of the transparent substrate; and a shielding pattern, disposed on a second side of the transparent substrate, and configured to shield light reflected from a surface of at least one of the plurality of components.

Array substrate, manufacturing method thereof, and display apparatus

A method of manufacturing a thin-film transistor (TFT) array substrate, including: forming a gate layer, a gate insulating layer, an oxide semiconductor layer, a source/drain electrode layer and a pixel electrode layer on a base substrate. The step of forming the source/drain electrode layer and the pixel electrode layer includes: forming a transparent conductive film and a first metallic film on the oxide semiconductor layer in sequence, to form a stack layer of the transparent conductive film and the first metallic film, in which the transparent conductive film contacts the oxide semiconductor layer; and forming source electrodes, drain electrodes and pixel electrodes by a single patterning process on the stack layer of the transparent conductive film and the first metallic film. One patterning process is saved, the production time is shortened, and the production cost is reduced.

Manufacturing method of thin-film transistor (TFT) array substrate

The present disclosure provide an array substrate and a method of manufacturing the same, and a display panel. The array substrate includes: a base substrate; a first signal transmission layer comprising a common electrode line; a first insulating layer covering the first signal transmission layer and having a first through hole at a position corresponding to the common electrode line; a first electrode layer located on the first insulating layer, the first electrode layer comprising a connection electrode located at the position of the first through hole; a second insulating layer covering the first electrode layer and having a second through hole at a position corresponding to the connection electrode; and a second electrode layer comprising a common electrode that covers the second through hole; the connection electrode contacts the common electrode line and the common electrode respectively.

Array substrate and method of manufacturing the same, and display panel

A touch display panel, a manufacturing method thereof and a method of detecting a touch for the same are disclosed. The touch display panel includes a first substrate () and a second substrate (). The first substrate () includes, within its non-display region, a plurality of gate lines () parallel to each other, a plurality of data lines () parallel to each other, a plurality of first touch electrode lines () parallel to the gate lines (), and a plurality of second touch electrode lines () parallel to the data lines (). The first substrate () further includes first touch electrodes () electrically connected to the first touch electrode lines () and second touch electrodes () electrically connected to the second touch electrode lines (). Between two adjacent data lines (), there are two sub-pixels arranged in the same row on the first substrate (). A second touch electrode line () is located between the two sub-pixels. A pair of gate lines () are located between any two adjacent rows of sub-pixels on the first substrate (), and a first touch electrode lines () is located between the pair of the gate lines (). Since the first touch electrode line () and the second touch electrode line () are disposed within the light-proof non-display region, their impact on the aperture ratio can be avoided.

Touch display panel, manufacturing method and detecting method for the same

An array substrate and a method of manufacturing the same, a display panel and a display device are provided. The array substrate includes a thin film transistor and a pixel electrode. An insulating layer is formed between a drain electrode of the thin film transistor and the pixel electrode. The drain electrode is in direct electrical contact with the pixel electrode through a via-hole in the insulating layer.

Array substrate including pixel electrode and drain electrode in direct contact to each other, and method of manufacturing the same, display panel, and display device

An array substrate, a manufacturing method thereof, and a display device are provided. The array substrate includes: a base substrate, a signal line disposed on the base substrate, an extinction layer disposed between the base substrate and the signal line, the extinction layer being configured to reduce an ambient light when the array substrate is located on a light exiting side. An orthographic projection of the signal line in a plane of the base substrate is coincided with an orthographic projection of the extinction layer in the plane of the base substrate.

Array substrate, manufacturing method thereof, and display device

The embodiments of the present invention disclose a parallax bather and a fabricating method thereof. The parallax barrier comprises a first transparent conducting layer (), a second transparent conducting layer (), and an insulating layer () between the first transparent conducting layer () and the second transparent conducting layer (). The first transparent conductive layer () is formed into a plurality of signal electrode lines (), and the second transparent conductive layer () is formed into a plurality of common electrode lines (). The signal electrode lines () and the common electrode lines () are arranged alternately, and the common electrode lines () are located in a gap between adjacent signal electrode lines () with the insulating layer () in between.

Parallax barrier and fabricating method thereof, display panel and display device

An array substrate, a display panel, a display device, and a method for fabricating an array substrate are provided. The array substrate comprises gate lines and data lines on a substrate plate which are insulated from each other and intersect to define sub-pixel units, and the data lines comprise a first data line and a second data line which are arranged side by side between two neighboring columns of sub-pixel units. Between two of the sub-pixel units which are neighbors in a column direction, at least a portion of the first data line is arranged in a layer different from the neighboring second data line. At least a part of the first data line is arranged in a layer different from that of the neighboring second data line, to overcome the problem of short circuit between dual data lines.

Array substrate, display panel, display device, and method for fabricating array substrate

A method of manufacturing an array substrate includes: forming a first functional layer comprising a plurality of array substrate areas and connection areas between adjacent array substrate areas; forming a plurality of conductive portions within each of the array substrate areas, the plurality of conductive portions extending from a corresponding one of the array substrate areas to a corresponding one of the connection areas and terminals of the plurality of conductive portions being in connection with capacitor lines within the corresponding one of the connection areas such that two capacitor lines between two adjacent array substrate areas face each other and are formed into a first capacitor element; forming a plurality of second functional layers on the first functional layer formed with the plurality of conductive portions and the capacitor lines, for forming a plurality of array substrates; and performing a cutting process at the connection areas between adjacent array substrates and removing the capacitor lines between the adjacent array substrates so as to form a plurality of separate array substrates. The present disclosure further provides an array substrate manufactured by the method.

Method of manufacturing array substrate and array substrate

The present invention discloses a method for manufacturing a thin-film transistor, comprising the steps of: forming a semiconductor active layer, and a doped semiconductor active layer; forming a source-drain metal layer; forming a channel region; and implanting ions for lowering the TFT leakage current into the surface of the semiconductor active layer in the channel region via ion implantation after forming the channel region. The invention further relates to a thin-film transistor, a TFT array substrate and a display device. The invention has the following beneficial effects: by implanting ions for lowering the TFT leakage current into the channel region, the electrical performance of a TFT may be improved, and the thickness of a semiconductor active layer in a channel region may be changed controllably.

Method for manufacturing thin-film transistor by implanting ions into channel region for lowering leakage current

An array substrate, a manufacturing method thereof and a display panel are disclosed. The array substrate includes: a base substrate, gate scanning lines, a gate-insulating layer, an active layer, data lines, a passivation layer, and pixel electrodes; the array substrate further includes: a bridge structure and a connection line corresponding to each data line; the bridge structure is located on the passivation layer and is provided in a same layer as the pixel electrodes; each connection line is located on the base substrate and is connected with the data line, through the bridge structure in an LED region and in a region under a scribe line of a counter substrate. Therefore the problem of defective display caused by breakage of data lines can be solved, and the display effect of a liquid crystal display device can be improved.

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Beijing, China

Yuchun Feng