Applied Materials, Inc.

Yu Yang

Deenesh Padhi

Xinhai Han

Hang Yu

Sanjay G Kamath

Allison Yau

Chuanxi Yang

Chuan Ying Wang

Exemplary methods of semiconductor processing may include flowing a silicon-containing precursor, a nitrogen-containing precursor, and diatomic hydrogen into a processing region of a semiconductor processing chamber. A substrate may be housed within the processing region of the semiconductor processing chamber. The methods may also include forming a plasma of the silicon-containing precursor, the nitrogen-containing precursor, and the diatomic hydrogen. The plasma may be formed at a frequency above 15 MHz. The methods may also include depositing a silicon nitride material on the substrate.

Systems and methods for depositing high density and high tensile stress films

Growing community of inventors

Cupertino, CA, United States of America

Yu Yang