Shin-etsu Chemical Co., Ltd.

Shin-etsu Chemical C O., Ltd.

Yu Yanase

Jun Horikoshi

Yuichi Hamada

Pellicle frame

The present invention is to provide a pellicle frame in a frame shape, having an upper end face to arrange a pellicle film thereon and a lower end face to face a photomask, and which is characterized by being provided with a notched part from an outer side face toward an inner side face of the upper end face, and to provide a pellicle characterized by including the pellicle frame as a component.

Pellicle frame and pellicle

A pellicle characterized by having an amount of released aqueous gas of 1×10Pa·L/s or less per pellicle, an amount of released hydrocarbon-based gas of 1×10Pa·L/s or less per pellicle in a range of measured mass number of 45 to 100 amu, and an amount of released hydrocarbon-based gas of 4×10Pa·L/s or less per pellicle in a range of measured mass number of 101 to 200 amu, under vacuum after the pellicle has been left to stand for 10 minutes in an atmosphere of 23° C. and 1×10Pa or less.

Pellicle

The present invention is to provide a pellicle frame characterized by including a metal or alloy having a linear expansion coefficient of 10×10(1/K) or less and further a density of 4.6 g/cmor less, and a pellicle characterized by including the pellicle frame as an element.

The present invention is to provide a pellicle frame in a frame shape having an upper end face on which a pellicle film is to be arranged and a lower end face to face a photomask, which is characterized by being provided with a notched part from the outer side face toward inner side face of the lower end face; a pellicle including the pellicle frame as an element; and a method for peeling a pellicle from a photomask onto which the pellicle has been attached, which is characterized by inserting a peeling jig into a notched part from a side face of a pellicle frame, and moving the peeling jig in an upper end face direction of the pellicle frame in this state to peel off the pellicle from the photomask.

Pellicle frame, pellicle, and method for peeling pellicle

The present invention is to provide a pellicle frame characterized by including a metal or alloy having a linear expansion coefficient of 10&#xd7;10(1/K) or less and further a density of 4.6 g/cmor less, and a pellicle characterized by including the pellicle frame as an element.

A pellicle characterized by having an amount of released aqueous gas of 1&#xd7;10Pa&#xb7;L/s or less per pellicle, an amount of released hydrocarbon-based gas of 1&#xd7;10Pa&#xb7;L/s or less per pellicle in a range of measured mass number of 45 to 100 amu, and an amount of released hydrocarbon-based gas of 4&#xd7;10Pa&#xb7;L/s or less per pellicle in a range of measured mass number of 101 to 200 amu, under vacuum after the pellicle has been left to stand for 10 minutes in an atmosphere of 23&#xb0; C. and 1&#xd7;10Pa or less.

Growing community of inventors

Annaka, Japan

Yu Yanase