Screen Holdings Co., Ltd.

Yu Yamaguchi

Masayuki Otsuji

Hiroaki Takahashi

Yuta Sasaki

Masahiko Kato

Naozumi Fujiwara

Yukifumi Yoshida

Song Zhang

A substrate processing method includes a polymer-containing liquid supplying step of supplying, to a major surface of a substrate, a polymer-containing liquid that contains an acidic polymer and a solvent dissolving the acidic polymer, a polymer film forming step of rotating the substrate with the polymer-containing liquid adhered to the major surface to spreadingly coat the polymer-containing liquid and form a polymer film, containing the acidic polymer, on the major surface of the substrate, and a rinsing step of supplying, to the major surface of the substrate, a rinse liquid that cleans the major surface of the substrate in a state in which the polymer film is formed on the major surface.

Substrate processing with polymer-containing liquid

A pre-drying processing liquid containing a sublimable substance that changes to gas without passing through to a liquid and a solvent in which the sublimable substance dissolves is supplied to a front surface of a substrate on which a pattern has been formed. Thereafter, the solvent is evaporated from the pre-drying processing liquid on the front surface of the substrate to thereby form a solidified body containing the sublimable substance on the front surface of the substrate. Thereafter, the solidified body is sublimated and thereby removed from the front surface of the substrate. A value acquired by multiplying a ratio of the thickness of the solidified body to the height of the pattern by 100 is greater than 76 and less than 219.

Substrate processing method, substrate processing apparatus and pre-drying processing liquid

To dry a substrate formed with a pattern on a front surface satisfactorily and with excellent drying performance, a substrate processing method comprises: a liquid film formation step of forming a liquid film of a processing liquid, in which cyclohexanone oxime is dissolved in a solvent, on a front surface of a substrate formed with a pattern by supplying the processing liquid to the front surface of the substrate; a solidified film formation step of forming a solidified film of the cyclohexanone oxime by solidifying the liquid film of the processing liquid; and a sublimation step of removing the solidified film from the front surface of the substrate by sublimating the solidified film.

Substrate processing method and substrate processing apparatus

Growing community of inventors

Kyoto, Japan

Yu Yamaguchi