United Microelectronics Corp.

Fujian Jinhua Integrated Circuit Co., Ltd.

Yu-Ting Li

Po-Cheng Huang

Kun-Ju Li

Fu-Shou Tsai

Wen-Chin Lin

Yi-Liang Liu

Chih-Hsun Lin

Wu-Sian Sie

Li-Chieh Hsu

Jen-Chieh Lin

Chia-Lin Hsu

Chang-Hung Kung

Chun-Tsen Lu

Yen-Ming Chen

Chun-Wei Hsu

Chun-Hsiung Wang

Teng-Chun Tsai

Chih-Chien Liu

Jie-Ning Yang

Chien-Nan Lin

Ren-Peng Huang

I-Lun Hung

Yi-Wei Chen

Chien-Ting Lin

Shih-Fang Tzou

Chun-Yuan Wu

Po-Chao Tsao

Chen-Yi Weng

I-Ming Tseng

Jing-Yin Jhang

Rai-Min Huang

Chia-Lung Chang

Kuo-Chin Hung

Rung-Yuan Lee

Wei-Jen Wu

Tzu-Hsiang Hung

Jia-Feng Fang

Chun-Liang Liu

Wei-Che Tsao

Shih-Ming Lin

Lan-Ping Chang

Yue-Han Wu

A semiconductor IC structure includes a substrate including at least a memory cell region and a peripheral region defined thereon, a plurality of memory cells formed in the memory cell region, at least an active device formed in the peripheral region, a plurality of contact plugs formed in the memory cell region, and at least a bit line formed in the memory cell region. The contact plugs are physically and electrically connected to the bit line. More important, bottom surfaces of the contact plugs are lower a surface of the substrate.

Method for forming semiconductor integrated circuit structure

Semiconductor integrated circuit structure

A planarization method is provided and includes the following steps. A substrate having a main surface is provided. A protruding structure is formed on the main surface. An insulating layer is formed conformally covering the main surface and the top surface and the sidewall of the protruding structure. A stop layer is formed on the insulating layer and at least covers the top surface of the protruding structure. A first dielectric layer is formed blanketly covering the substrate and the protruding structure and a chemical mechanical polishing process is then performed to remove a portion of the first dielectric layer until a portion of the stop layer is exposed thereby obtaining an upper surface. A second dielectric layer having a pre-determined thickness is formed covering the upper surface.

Planarization method

A method for improving wafer surface uniformity is disclosed. A wafer including a first region and a second region is provided. The first region and the second region have different pattern densities. A conductive layer is formed on the wafer. A buffer layer is then formed on the conductive layer. The buffer layer is polished until the conductive layer is exposed. A portion of the conductive layer and the remaining buffer layer are etched away.

Method for improving wafer surface uniformity

Semiconductor integrated circuit structure and method for forming the same

A method of planarizing a substrate surface is disclosed. A substrate having a major surface of a material layer is provided. The major surface of the material layer comprises a first region with relatively low removal rate and a second region of relatively high removal rate. A photoresist pattern is formed on the material layer. The photoresist pattern masks the second region, while exposes at least a portion of the first region. At least a portion of the material layer not covered by the photoresist pattern is etched away. A polish stop layer is deposited on the material layer. A cap layer is deposited on the polish stop layer. A chemical mechanical polishing (CMP) process is performed to polish the cap layer.

Method of planarizing substrate surface

A method of fabricating a gate cap layer includes providing a substrate with an interlayer dielectric disposed thereon, wherein a recess is disposed in the interlayer dielectric and a metal gate fills in a lower portion of the recess. Later, a cap material layer is formed to cover the interlayer dielectric and fill in an upper portion of the recess. After that, a first sacrifice layer and a second sacrifice layer are formed in sequence to cover the cap material layer. The first sacrifice layer has a composition different from a composition of the cap material layer. The second sacrifice layer has a composition the same as the composition of the cap material layer. Next, a chemical mechanical polishing process is preformed to remove the second sacrifice layer, the first sacrifice layer and the cap material layer above a top surface of the interlayer dielectric.

Method of fabricating a gate cap layer

A method for forming a semiconductor structure includes following steps. A substrate is provided, and a semiconductor layer is formed on the substrate. Next, a SiN-rich pre-oxide layer is formed on the semiconductor layer. After forming the SiN-rich pre-oxide layer, an anneal treatment is performed to partially transfer the SiN-rich pre-oxide layer to form a SiN layer and a SiO layer. And the SiO layer is formed the on the SiN layer. Subsequently, a planarization process is performed to remove a portion of the SiO layer to expose the SiN layer.

Method for forming semiconductor structure

A method for planarizing a silicon layer includes providing a silicon layer having at least one recess therein. Next, a photoresist layer is formed to cover the silicon layer and fill up the recess. Then, the photoresist layer is hardened. After that, part of the photoresist layer is removed by taking a top surface of the silicon layer as a stop layer. Finally the photoresist layer and the silicon layer are etched back simultaneously to remove the photoresist layer entirely.

Method for planarizing material layer

A method for fabricating semiconductor device is disclosed. The method includes the steps of: providing a substrate; forming a first material layer on the substrate; forming a stop layer on the first material layer; forming a second material layer on the stop layer; and performing a planarizing process to remove the second material layer, the stop layer, and part of the first material layer for forming a gate layer.

Method for fabricating semiconductor device

A method for manufacturing a semiconductor device is provided. A substrate with an insulation formed thereon is provided, wherein the insulation has plural trenches, and the adjacent trenches are spaced apart from each other. A barrier layer is formed on an upper surface of the insulation and in sidewalls of the trenches, and the barrier layer comprises overhung portions corresponding to the trenches. A seed layer is formed on the barrier layer. Then, an upper portion of the seed layer formed on an upper surface of the barrier layer is removed. An upper portion of the barrier layer is removed for exposing the upper surface of the insulation. Afterwards, the conductors are deposited along the seed layer for filling up the trenches, wherein the top surfaces of the conductors are substantially aligned with the upper surface of the insulation.

Method for manufacturing semiconductor device with a barrier layer having overhung portions

A manufacturing method of a semiconductor device is provided. The manufacturing method includes the following steps. A plurality of fin structures are formed in a first area and a second area of a substrate. A first density of the fin structures in the first area is lower than a second density of the fin structures in the second area. A gate dielectric layer is formed on the fin structures. An amorphous silicon layer is formed on the gate dielectric layer and the fin structures in the first area and the second area. Part of the amorphous silicon layer which is disposed in the first area is annealed to form a crystalline silicon layer by a laser. The crystalline silicon layer disposed in the first area and the amorphous silicon layer disposed in the second area are polished.

Manufacturing method of semiconductor device

A method of forming target patterns is disclosed. A substrate with multiple fins is provided. A plurality of mask patterns is formed across the fins and in at least a part of non-target areas. Target patterns are formed respectively in trenches between the mask patterns. The mask patterns are removed. With the disclosed method, the target patterns can be formed with substantially equal thickness. In the case that the target patterns are dummy gates, the conventional defects such as dummy gate residues or gate trench widening caused by uneven thicknesses are not observed upon the dummy gate removal step.

Method of forming target patterns

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Chiayi, Taiwan

Yu-Ting Li