Taiwan Semiconductor Manufacturing Comp. Ltd.

Industrial Technology Research Institute

Novatek Microelectronics Corp.

Yu-Sheng Chen

Hung-Li Chiang

Tzu-Chiang Chen

Jung-Piao Chiu

Chao-Ching Cheng

Jau-Yi Wu

Xinyu Bao

Heng-Yuan Lee

Win-San Khwa

Frederick Chen

Jin Cai

Carlos H Diaz

Shao-Ming Yu

Yu Chao Lin

Hengyuan Lee

Hsin-Han Lee

Da-Ching Chiou

Cheng-Hsien Wu

Chien-Min Lee

Tung Ying Lee

Yu-Chao Lin

Yao-Jen Chang

Chia-Wen Chang

Hon-Sum Philip Wong

Ding-Yeong Wang

Shan-Yi Yang

Pang-Shiu Chen

Kerem Akarvardar

Pei-Yi Gu

Yen-Ya Hsu

Jui-Ming Chen

Ching-Chih Hsu

Tung-Ying Lee

Kai-Tai Chang

Wen-Pin Lin

Wei-Su Chen

Yu-Tso Lin

Jer-Fu Wang

Chih-He Lin

Elia Ambrosi

Tai-Yuan Wu

I-Jung Wang

Zhe-Hui Lin

Yu-De Lin

Yu-Chen Hsin

Jia-Shian Tsai

Duan-Lee Tang

Disclosed herein, in some embodiments, is a memory device. The memory device includes a bottom electrode disposed over a substrate and a top electrode disposed over the bottom electrode. An upper surface of the bottom electrode faces away from the substrate. A bottom surface of the top electrode faces the substrate. A data storage layer is arranged between the bottom electrode and the top electrode. At least a portion of the bottom surface of the top electrode does not overlap with any portion of the top surface of the bottom electrode along a first direction parallel to the bottom surface of the top electrode. Furthermore, at least a portion of the top surface of the bottom electrode does not overlap with any portion of the bottom surface of the top electrode along the first direction.

Data storage element and manufacturing method thereof

A memory device is provided. The memory device includes a bottom electrode, a first data storage layer, a second data storage layer, an interfacial conductive layer and a top electrode. The first data storage layer is disposed on the bottom electrode and in contact with the bottom electrode. The second data storage layer is disposed over the first data storage layer. The interfacial conductive layer is disposed between the first data storage layer and the second data storage layer. The top electrode is disposed over the second data storage layer.

Memory device and operating method thereof

A control method to operate a memory device, a control method to operate a memory system and a control system are provided. The control method includes providing a first voltage to a memory device for accessing a memory element of the memory device; obtaining an aging information of the memory device; and providing a second voltage to the memory device according to the aging information, wherein the first voltage and the second voltage are reverse biased voltages.

Adjusting operation voltage of cross point memory according to aging information

A memory cell includes a dielectric structure, a storage element structure, and a top electrode. The storage element structure is disposed in the dielectric structure, and the storage element structure includes a first portion and a second portion. The first portion includes a first side and a second side opposite to the first side, where a width of the first side is less than a width of the second side. The second portion is connected to the second side of the first portion, where a width of the second portion is greater than the width of the first side. The top electrode is disposed on the storage element structure, where the second portion is disposed between the first portion and the top electrode.

Memory cell, semiconductor device having the same, and methods of manufacturing the same

A memory device includes a first electrode, a selector layer and a plurality of first work function layers. The first work function layers are disposed between the first electrode and the selector layer, and a work function of the first work function layer increases as the first work function layer becomes closer to the selector layer.

Memory devices with selector layer and methods of forming the same

A memory device includes a memory cell array. The memory cell array includes first-tier word lines extending in a first direction, second-tier word lines disposed below the first-tier word lines and extending in a second direction angularly offset from the first direction, and bit lines extending in a third direction angularly offset from the first and second directions. The bit lines are arranged between a pair of the first-tier word lines and between a pair of the second-tier word lines.

Memory device and method of forming the same

A memory circuit and a method for reading a memory circuit are provided. The memory circuit includes reference memory cells and operation memory cells. The method includes reading a selected reference memory cell at a first time to get a first voltage; reading the selected reference memory cell at a second time after the first time to get a second voltage; adjusting a read voltage of the memory cell to be an adjusted read voltage of the memory cell according to the voltage difference between the first voltage and the second voltage; applying the adjusted read voltage on a selected operation memory cell corresponding to the selected reference memory cell; and applying the adjusted read voltage on other selected operation memory cells in a same row of the memory array corresponding to the selected reference memory cell. The time difference between the first time and the second time is within a range smaller than a predetermined time difference according to characteristics of a corresponding selector in the selected reference memory cell or the selected operation memory cell.

Memory circuit and method for reading memory circuit

A memory cell includes a bottom electrode, a storage element layer, a first buffer layer, and a top electrode. The storage element layer is disposed over the bottom electrode. The first buffer layer is interposed between the storage element layer and the bottom electrode, where a thermal conductivity of the first buffer layer is less than a thermal conductivity of the storage element layer. The top electrode is disposed over the storage element layer, where the storage element layer is disposed between the top electrode and the first buffer layer.

An operation method for a memory device is provided. The memory device includes a two-terminal selector and a resistance variable storage element coupled to the two-terminal selector. The method includes providing a voltage pulse to the memory device. A voltage applied across the two-terminal selector during a falling part of the voltage pulse falls below a holding voltage of the two-terminal selector. A voltage falling rate of the falling part at which the voltage applied across the two-terminal selector reaches the holding voltage is raised for reducing threshold voltage drift of the two-terminal selector.

Operation methods for ovonic threshold selector, memory device and memory array

A memory device that includes at least one memory cell is introduced. Each of the at least one memory cell is coupled to a bit line and a word line. Each of the at least one memory cell includes a memory element and a selector element, in which the memory element is configured to store data of the at least one memory cell. The selector element is coupled to the memory element in series and is configured to select the memory element for a read operation and amplify the data stored in the memory element in the read operation.

Memory cell with built-in amplifying function, memory device and method using the same

The present disclosure relates to an integrated circuit. The integrated circuit has a plurality of bit-line stacks disposed over a substrate and respectively including a plurality of bit-lines stacked onto one another. A data storage structure is over the plurality of bit-line stacks and a selector is over the data storage structure. A word-line is over the selector. The selector is configured to selectively allow current to pass between the plurality of bit-lines and the word-line. The plurality of bit-line stacks include a first bit-line stack, a second bit-line stack, and a third bit-line stack. The first and third bit-line stacks are closest bit-line stacks to opposing sides of the second bit-line stack. The second bit-line stack is separated from the first bit-line stack by a first distance and is further separated from the third bit-line stack by a second distance larger than the first distance.

Memory array with asymmetric bit-line architecture

Various embodiments provide methods for configuring a phase-change random-access memory (PCRAM) structures, such as PCRAM operating in a single-level-cell (SLC) mode or a multi-level-cell (MLC) mode. Various embodiments may support a PCRAM structure being operating in a SLC mode for lower power and a MLC mode for lower variability. Various embodiments may support a PCRAM structure being operating in a SLC mode or a MLC mode based at least in part on an error tolerance for a neural network layer.

Methods of controlling PCRAM devices in single-level-cell (SLC) and multi-level-cell (MLC) modes and a controller for performing the same methods

A method includes: generating a first difference between a first resistance value of a first memory cell and a first predetermined resistance value; generating a first signal based on the first difference; applying the first signal to the first memory cell to adjust the first resistance value; and after the first signal is applied to the first memory cell, comparing the first resistance value and the first predetermined resistance value, to further adjust the first resistance value until the first resistance value reaches the first predetermined resistance value. A memory device is also disclosed herein.

Memory device and method thereof

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Taoyuan, Taiwan

Yu-Sheng Chen