Visera Technologies Company Limited

Netronix, Inc.

Yu-Ming Tseng

Tian-Wen Liao

Yuan-Chun Chao

Yi-Chang Chang

Chin-Chun Wen

Wei-Chuan Chen

An apparatus for removing a photoresist layer from at least one alignment mark of a wafer is provided. The apparatus includes a holder, a solvent dispenser, and a suction unit. The holder is used to support the wafer, wherein the alignment mark is formed in a peripheral region of the wafer. The solvent dispenser is used to spray a solvent onto the photoresist layer on the alignment mark of the wafer to generate a dissolved photoresist layer. The suction unit is used to remove the dissolved photoresist layer and the solvent from the wafer through exhausting.

Apparatus and method for removing photoresist layer from alignment mark

An Ethernet adaptor comprises a box having an upper and a lower covers, a female connector and a circuit board. The upper cover includes an upper opening having a female press-fit element on the side wall, and two upper positioning ribs in the interior. The lower cover includes a lower opening having two positioning protrusions on a lower edge, and two lower positioning ribs in the interior. The upper opening, lower opening, upper positioning ribs and lower positioning ribs form a through-hole. The female connector is accommodated in the through-hole and includes an L-shape body. The bottom of the L-shape body has positioning notches corresponding to the positioning protrusions. An outward-facing surface of a vertical portion of the L-shape body has two positioning members. An inward-facing surface of the vertical portion extends through the through-hole to the interior of the box to connect with the circuit board inside the box.

Ethernet adaptor

Growing community of inventors

Hsinchu, Taiwan

Yu-Ming Tseng