Jeol Ltd.

Yu Jimbo

Hidetaka Sawada

Takeshi Kaneko

Bryan Walter Reed

Kazuki Yagi

Ruth Shewmon Bloom

Sang Tae Park

Masashi Shimizu

Norihiro Okoshi

A contamination prevention irradiation device includes a generation unit and a mirror unit. The generation unit generates a laser beam. The mirror unit has a mirror surface for reflecting a laser beam. The laser beam reflected on the mirror surface is applied to a specimen disposed inside an objective lens. The laser beam is composed of a pulse train. Once a laser beam is applied to the specimen before observation of the specimen, deposition of contaminants on the specimen can be prevented for a predetermined subsequent period.

Electron microscope and specimen contamination prevention method

A charged particle beam device including: a charged particle beam source which emits a charged particle beam; a blanking device which has an electrostatic deflector that deflects and blocks the charged particle beam; an irradiation optical system which irradiates a specimen with the charged particle beam; and a control unit which controls the electrostatic deflector, the control unit performing processing of: acquiring a target value of a dose of the charged particle beam for the specimen; setting a ratio A/B of a time A during which the charged particle beam is not blocked to a unit time B (where A&#x2260;B, A&#x2260;0), based on the target value; and operating the electrostatic deflector based on the ratio.

Charged particle beam device

There is provided a liner tube capable of reducing the effects of magnetic field variations on an electron beam. The liner tube () is disposed inside the electron optical column () of an electron microscope (). The interior of the tube () forms a path for the electron beam (EB). The liner tube () has a first cylindrical member () that is made of copper, gold, silver, or an alloy consisting principally of one of these metals.

Liner tube and electron microscope

A spherical aberration corrector is offered which permits a correction of deviation of the circularity of at least one of an image and a diffraction pattern and a correction of on-axis aberrations to be carried out independently. The spherical aberration corrector () is for use with a charged particle beam instrument () for obtaining the image and the diffraction pattern and has a hexapole field generating portion () for producing plural stages of hexapole fields, an octopole field superimposing portion () for superimposing an octopole on at least one of the plural stages of hexapole fields to correct deviation of the circularity of at least one of the image and diffraction pattern, and a deflection portion () for deflecting a charged particle beam.

Growing community of inventors

Tokyo, Japan

Yu Jimbo