Taiwan Semiconductor Manufacturing Comp. Ltd.

Yu-Jen Yang

Jun-Xiu Liu

Chung-Pin Chou

Kai-Lin Chuang

Yan-Cheng Chen

Sheng-Ching Kao

A process tube device can detect the presence of any external materials that may reside within a fluid flowing in the tube. The process tube device detects the external materials in-situ which obviates the need for a separate inspection device to inspect the surface of a wafer after applying fluid on the surface of the wafer. The process tube device utilizes at least two methods of detecting the presence of external materials. The first is the direct measurement method in which a light detecting sensor is used. The second is the indirect measurement method in which a sensor utilizing the principles of Doppler shift is used. Here, contrary to the first method that at least partially used reflected or refracted light, the second method uses a Doppler shift sensor to detect the presence of the external material by measuring the velocity of the fluid flowing in the tube.

Growing community of inventors

Hsinchu, Taiwan

Yu-Jen Yang