Taiwan Semiconductor Manufacturing Comp. Ltd.

Mediatek Corporation

Yu-Hsiang Lin

Chih-Hsing Chu

Fang-Shan Yang

Ching-He Sun

Ru-Gun Liu

Tsai-Sheng Gau

Hua-Tai Lin

Cheng-Yi Huang

Cheng-Cheng Kuo

Shang-Yu Huang

Jeng-Shiun Ho

Hsing-Hsiang Wang

Min-Hung Cheng

Luke Lo

Wei-Da Chen

Wen-Han Chu

P Y Chiu

Miau-Shing Tsai

Tom Peng

Ching-Horng Chen

Ting-Chun Liu

Jing-Wei Shih

In an embodiment, a method includes: receiving, within a processing chamber, a wafer with a photoresist mask above a metal layer, wherein the processing chamber is connected to a gas source; applying an etchant configured to etch the metal layer in accordance with the photoresist mask within the processing chamber; and applying gas from the gas source to perform plasma ashing in the processing chamber.

Metal etching with in situ plasma ashing

Various examples and techniques pertaining to audio output monitoring for failure detection of warning sound playback are described. In one aspect, audio data, which includes a plurality of bits of a first sound sample and one or more control bits for integrity check, is retrieved from a data storage. The audio data is processed by: (i) performing an integrity check on the first sound sample based on the one or more control bits, and (ii) playing back a first sound using the first sound sample. The first sound can be a warning sound in automobile applications.

Audio output monitoring for failure detection of warning sound playback

The present disclosure provides a photomask. The photomask includes a first integrated circuit (IC) feature formed on a substrate; and a second IC feature formed on the substrate and configured proximate to the first IC feature. The first and second IC features define a dense pattern having a first pattern density. The second IC feature is further extended from the dense pattern, forming an isolated pattern having a second pattern density less than the first pattern density. A transition region is defined from the dense pattern to the isolated pattern. The photomask further includes a sub-resolution rod (SRR) formed on the substrate, disposed in the transition region, and connected with the first IC feature.

Sub-resolution rod in the transition region

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Hsinchu, Taiwan

Yu-Hsiang Lin