Kla Tencor Corporation

Mattson Technology, Inc

Beijing E-town Semiconductor Technology, Co., Ltd

Kla-tenor Corp.

Applied Materials, Inc.

Kla-tencor Technologies Corporation

Yu Guan

Maolin Long

Mark Armstrong McCord

Hamid Noorbakhsh

Ian R Smith

Christian Wolters

Alan D Brodie

Nils Johansson

Weimin Zeng

Hongqing Shan

Steven R Lange

Hong Fu

Zhifeng Sui

Ralph Nyffenegger

Don Brayton

James George

An induction coil assembly is disclosed including two induction coils. Each induction coil includes a first winding commencing from a first terminal end in a first position in the z-direction and transitioning to a radially inner position in a plane normal to the z-direction and a second winding commencing from the radially inner position and transitioning to a radially outer position in a second plane normal to the z-direction and terminating in a second terminal end. Plasma processing apparatuses incorporating the induction coil assembly are also provided.

Induction coil assembly for plasma processing apparatus

A plasma processing apparatus including a processing chamber having one or more sidewalls and a dome is provided. The plasma processing apparatus includes a workpiece support disposed in the processing chamber configured to support a workpiece during processing, an induction coil assembly for producing a plasma in the processing chamber, a Faraday shield disposed between the induction coil assembly and the dome, the Faraday shield comprising an inner portion and an outer portion, and a thermal management system. The thermal management system including one or more heating elements configured to heat the dome, and one or more thermal pads disposed between an outer surface of the dome and the heating elements, wherein the one or more thermal pads are configured to facilitate heat transfer between the one or more heating elements and the dome. Thermal management systems and methods for processing workpieces are also provided.

Plasma processing apparatus

Light-emitting devices, such as LEDs, are tested using a photometric unit. The photometric unit, which may be an integrating sphere, can measure flux, color, or other properties of the devices. The photometric unit may have a single port or both an inlet and outlet. Light loss through the port, inlet, or outlet can be reduced or calibrated for. These testing systems can provide increased reliability, improved throughput, and/or improved measurement accuracy.

Light-emitting device test systems

The stabilization of a light-emitting diode (LED) calibration standard includes a light-emitting diode (LED), or an array of LEDs; a cylindrical hood surrounding the LED; an interior baffle for keeping the light output of the LED, and ambient light from behind the LED, from escaping to the other side; a photodetector for receiving the light output of the LED and generating a signal proportional to luminous output; and a hood surrounding the photodetector. A variable current source receives the signal and stabilizes the LED light output by adjusting the operating current of the LED to maintain a constant light output from the LED.

LED calibration standard having fast stabilization and lasting stability

The present invention includes providing a plurality of standard particles; providing a substantially crystalline material having one or more characteristic spatial parameters, disposing the plurality of standard particles proximate to a portion of the substantially crystalline material, acquiring imagery data of the plurality of standard particles and the portion of the substantially crystalline material, establishing a spatial relationship between the plurality of standard particles and the portion of the substantially crystalline material utilizing the acquired imagery data, and determining one or more spatial parameters of the plurality of standard particles utilizing the one or more characteristic spatial parameters of the substantially crystalline material and the established spatial relationship between the plurality of standard particles and the portion of the substantially crystalline material.

Determination of absolute dimensions of particles used as calibration standards for optical measurement system

Methods for forming calibration standards for an inspection system and calibration standards are provided. One method includes scanning a first and a second specimen with an optical system. Master standard particles having a lateral dimension traceable to a national or international authority or first principles measurements are deposited on the first specimen. Product standard particles are deposited on the second specimen. In addition, the method includes determining a lateral dimension of the product standard particles by comparing data generated by scanning the two specimens. One calibration standard includes particles having a lateral dimension of less than about 100 nm deposited on a specimen. A distribution of the lateral dimension has a full width at half maximum of less than about 3%. The uncertainty of the lateral dimension is less than about 2%. Therefore, the standard meets the requirements for the 130 nm technology generation of semiconductor devices.

Methods for forming a calibration standard and calibration standards for inspection systems

A substrate processing apparatus comprises a chamber capable of processing a substrate , a radiation source to provide a radiation, a radiation polarizer adapted to polarize the radiation to one or more polarization angles that are selected in relation to an orientation of a feature being processed on the substrate , a radiation detector to detect radiation reflected from the substrate during processing and generate a signal, and a controller to process the signal.

Monitoring substrate processing using reflected radiation

Disclosed are methods and apparatus for designing an optical spectrum of an illumination light beam within an optical inspection system. A set of conditions for inspecting a film on a sample by directing an illumination light beam at the sample is determined. At least a portion of the illumination light beam is reflected off the sample and used to generate an image of at least a portion of the film on the sample. A plurality of peak wavelength values are determined for the optical spectrum of the illumination light beam so as to control color variation in the image of the film portion. The determination of the peak wavelengths is based on the determined set of conditions and a selected thickness range of the film. In one specific embodiment, the color variation is reduced, while in another embodiment the color variation is increased to enhance pattern contrast. An apparatus which implements the designed optical spectrum is also disclosed.

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San Jose, CA, United States of America

Yu Guan