Taiwan Semiconductor Manufacturing Comp. Ltd.

Yu Chuan Liang

Chu Fu Chen

Chun Hao Liao

A method includes: providing a substrate defining a scribe line region and a device region adjacent to the scribe line region; depositing a first mask layer over the device region and the scribe line region; patterning the first mask layer to define a plurality of first areas in the device region and a plurality of second areas in the scribe line region, wherein the first areas and the second areas are parallel and extending in a first direction from a top-view perspective; performing a first ion implantation to form first well regions in the first areas and second well regions in the second areas; coupling conductive pads to the second well regions; and performing a test on the second well regions through the conductive pads.

Growing community of inventors

Hsinchu, Taiwan

Yu Chuan Liang