Taiwan Semiconductor Manufacturing Comp. Ltd.

Other

Yu-Chia Chang

Chih-I Peng

Yao-Hsiang Liang

Wen-Ten Chen

Chih-Chiang Yang

Yu-Sheng Shen

Chen-Chia Chiu

Pei Wei Yeh

Chung-I Cheng

Zuei-Chown Jou

Wen-Yang Ko

Geoffrey Wen Tai Shuy

Yung-Tai Tseng

Chu-Hsuan Cheng

Jain-Li Wu

A thin-film optical recording medium and compatible materials is disclosed. When the transparent layer and the reflecting layer of the present invention are exposed to a light beam, the two layers react to form a semi-transparent reflective alloy/compound area. The presence of such area (1) decreases the effective optical thickness of the transparent layer and/or (2) forms a region of changed optical n & k and/or (3) changes the optical polarization angle. At least one of the above three effects produces an optical contrast before and after the recording from which the signal modulation required for reading the optical media can be derived. The present invention allows high-density, high-resolution, high-speed recording of data that is highly compatible with the full visible-light spectrum.

Thin-film design for optical recording media

The present invention discloses a contamination prevention system and method of use having a contamination prevention shield that cooperates with a high pressure rinse apparatus to prevent contamination of particles within a CMP apparatus. The contamination prevention shield has a cleaning cup, two vertical side shields, a front vertical shield, and a floor that cooperate to prevent leakage of fluid splattered during a high pressure rinse of the CMP apparatus and an interior portion of a CMP apparatus housing; and a high pressure rinse apparatus connected to the contamination prevention shield having a conduit with at least one nozzle for dispensing cleaning fluid during a high pressure rinse cycle. Additionally, a plurality of contamination prevention shields may be used in combination with the high pressure rinse apparatus to further prevent contamination of an interior portion of the housing and the CMP apparatus.

Contamination prevention system and method

A conformal disk holder for holding a rotating disk against a surface of a polishing pad is described. The conformal disk holder can be used for any polishing apparatus, but is particularly suited for use in a CMP pad conditioning disk. The conformal disk holder is constructed by a cover member, a flexural plate member and a base member. The flexural plate member has a center protrusion with a downwardly facing convex surface for intimately engaging an upwardly facing concave surface on a center protrusion of the base member. The intimate engagement between the convex surface and the concave surface allows at least a 5&deg; tilt of the base member from a horizontal plane, and preferably allows a tilt between about 5&deg; and about 30&deg;.

Conformal disk holder for CMP pad conditioner

An apparatus and a method for removing an adhesive bonded pad from a backing plate are disclosed. The apparatus and the method are particularly suitable for removing a polishing pad in a chemical mechanical polishing apparatus, however, they can be used for removal of any other adhesively bonded pad on a rigid surface. The removal apparatus can be advantageously used without causing any danger to a machine operator even when a slippage of the tool has occurred. The T-shaped removal tool can be operated in a rotational motion such that an adhesive bond existed between a pad and a backing surface may be broken by shear force. A minimal amount of force is required due to the large T-shaped handle used for the removal operation.

Apparatus and method for removing an adhesive bonded pad

The present invention discloses a method for preventing particle contamination in a polishing machine that utilizes slurry composition for the removal of material from the surface of a substrate. The novel method is particularly suited for use in a chemical mechanical polishing apparatus in which a slurry composition is used. The method includes the step of providing a plurality of cleaning devices each having a bendable, shapable conduit and a spray nozzle for dispensing a cleaning solvent on the spindle and the conditioner arm utilized in the CMP apparatus. The present invention further discloses an apparatus for use in carrying out a method for preventing particle contamination in a CMP apparatus by using bendable, shapable conduits for dispensing a cleaning solvent such as deionized water onto the chamber components for removing slurry deposits that may have splattered thereon and therefore, eliminating sources for particle contamination.

Method and apparatus for preventing particle contamination in a polishing machine

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Hsin-Chu, Taiwan

Yu-Chia Chang