Taiwan Semiconductor Manufacturing Comp. Ltd.

Chipmos Technologies Inc.

Yu-Cheng Chang

Chieh-Jan Huang

Ming-Lee Lee

Chiang-Jeh Chen

Keng-Hui Pan

Tzu-Yang Lin

Cheng-Han Wu

Chen-Yu Liu

Kuo-Shu Tseng

Chen Yi Hsu

Tsung-Lin Chen

Shang-Sheng Li

Ying-Lin Chen

Cheng-Ting Wu

Cheng-Heng Sun

Jenn-Tsair Liao

I-Cheng Lu

Ching-Ping Chen

Tsu-Ting Wang

Yi-Kuang Chen

Jin-Yng Hwang

Hsin-Chen Wu

A method includes moving a drum containing a chemical liquid into a chamber of a chemical liquid supplying system. The drum is connected with a testing pipe. The chemical liquid is pumped from the drum to the testing pipe. A condition of the chemical liquid flowing through the testing pipe is monitored. Whether the chemical liquid is supplied to a processing tool is determined based on the condition of the chemical liquid.

Method of supplying chemical liquid

A lithography includes a storage tank that stores process chemical fluid, an anti-collision frame, and an integrated sensor assembly. The storage tank includes a dispensing port positioned at a lowest part of the storage tank in a gravity direction. The anti-collision frame is coupled to the storage tank. An integrated sensor assembly is disposed on at least one of the anti-collision frame and the storage tank to measure a variation in fluid quality in response to fluid quality measurement of fluid.

Liquid storage for facility chemical supply system

In accordance with some embodiments, a method for processing semiconductor wafer is provided. The method includes connecting a drum which stores the chemical liquid with a testing pipe. The method also includes guiding the chemical liquid in the drum into the testing pipe. In addition, the method includes detecting a condition of the chemical liquid in the testing pipe. The method further includes determining if the condition of the chemical liquid is acceptable. When the condition of the chemical liquid is acceptable, supplying the chemical liquid to a processing tool at which the semiconductor wafer is processed.

Chemical liquid supplying system and method of supplying chemical liquid

An apparatus includes a processing chamber having a plasma containing region, a dielectric plate secured on top of the processing chamber, a power source separated from the plasma containing region by the dielectric plate, and a chuck supported within the processing chamber. The chuck is operable and configured to move with respect to the power source.

Apparatus and method to improve uniformity and reduce local effect of process chamber

A chip package structure is provided. The chip package structure comprises a first substrate, a second substrate and a plurality of chips. Therein, one of the chips is connected to the first substrate and electrically connected to the first substrate through a via hole of the first substrate. Thereby, the second substrate does not need the via hole for electrical connection of chips and thus, the surface thereof is adapted to remain intact to allow for the disposition of conductive balls throughout the surface.

Chip package structure

A capacity management system and method. The system includes a demand management module and a planning engine. The demand management module receives a demand comprising a request for a quantity of a device and a corresponding required date. The planning engine converts original planning buckets with varying bucket lengths into target planning buckets that have substantially identical bucket lengths. The planning engine further retrieves a cycle time of the device, and selects one of the target planning buckets accordingly. The planning engine also plans a capacity in the selected target planning bucket according to the quantity of the device.

Capacity management system and method

Growing community of inventors

Kaohsiung County, Taiwan

Yu-Cheng Chang