Jsr Corporation

Daihatsu Motor Company, Ltd.

University of Yamanashi

Takahata Precision Co., Ltd.

Yousuke Konno

Nakaatsu Yoshimura

Kohei Goto

Yoshitaka Yamakawa

Fumihiro Toyokawa

Masayuki Takahashi

Junichi Takahashi

Takashi Okada

Koichiro Asazawa

Kenji Miyatake

Toshiaki Kadota

Toshihiro Otsuki

Naoki Yokota

Igor Rozhanskii

Junpei Miyake

Toshihiro Ohtsuki

Aoi Takano

Teruhiko Umehara

Takeshi Kato

Katsuya Nagase

Taro Kimura

Mayumi Shinoda

Kimihiko Yoshii

Provided are an anion exchange resin being capable of producing an electrolyte membrane, a binder for forming an electrode catalyst layer and a battery electrode catalyst layer, which have improved electrical properties and chemical properties. For example, used is an anion exchange resin which has a hydrophobic unit being composed of bisphenol AF residues repeated via carbon-carbon bond and a hydrophilic unit being composed of hydrophilic groups repeated via carbon-carbon bond, in which the hydrophilic group is formed by connecting an anion exchange group to a fluorene backbone via a divalent saturated hydrocarbon group, and in which the hydrophobic unit and the hydrophilic unit are connected via carbon-carbon bond.

Anion exchange resin, electrolyte membrane, binder for forming electrode catalyst layer, fuel cell electrode catalyst layer and fuel cell

A method for forming a resist under layer film includes providing a composition for forming a resist under layer film on a substrate which is to be processed. The composition includes a solvent and a calixarene compound or a derivative of the calixarene compound. The composition is set under an oxidizing atmosphere with an oxygen content of 1% or more by volume to form a resist under layer film.

Method for forming resist under layer film, pattern forming method and composition for resist under layer film

A resist under layer film-forming composition comprises (A) an aminated fullerene having at least one amino group bonded to a fullerene skeleton, and (B) a solvent. The composition exhibits excellent etching resistance, causes an under layer film pattern to bend only with difficulty in a dry etching process, and can transfer a resist pattern faithfully onto a substrate to be processed with high reproducibility.

Pattern-forming method

The invention described herein relates to a polyarylene copolymer comprising a structural unit represented by formula (1'): where the structural variables are defined herein. The invention also relates to a solid polymer electrolyte, a proton conductive membrane and A proton conductive membrane for direct methanol fuel cell which contains the polyarylene copolymer.

Aromatic compound and sulfonated polyarylene polymer

A composition for forming a resist lower layer film, which contains (A) a resin, (B) a butyl ether group-containing crosslinking agent and (C) a solvent.

Composition for forming resist lower layer film

This invention provides a method for resist under layer film formation, which can form a resist under layer film which can function as an anti-reflection film, is excellent in pattern transfer properties and etching resistance, and does not cause bending of a pattern even in the transfer of a fined pattern, and a composition for the resist under layer film for use in the method, and a method for pattern formation. The method for resist under layer film formation comprises the steps of coating a composition for resist under layer film formation (for example, a composition comprising a compound having a phenolic hydroxyl group, a solvent, and an accelerator) onto a substrate to be processed, and treating the formed coating film under an oxidizing atmosphere having an oxygen concentration of not less than 1% by volume and a temperature of 300&#xb0; C. or higher to form a resist under layer film.

Pattern forming method

A composition for forming a lower layer film comprises a polymer (A) having a naphthalene derivative structural unit shown by the following formula (1), wherein Rrepresents a hydroxyl group and the like, X represents a substitutable alkylene group having 1 to 20 carbon atoms and the like, n represents 0 to 6, m represents 1 to 8, and n+m represents an integer from 1 to 8, provided that two or more Rs may be the same or different and two or more Xs may be the same or different.

Composition for forming lower layer film and pattern forming method

The present invention provides a sulfonic group-containing polyarylene block copolymer superior to the perfluoroalkylsulfonic acid polymers in cost, conductive properties and proccessability, a process for producing the copolymer, a solid polymer electrolyte and a proton conductive membrane. The sulfonic group-containing polyarylene block copolymer includes a polymer segment with an ion conductive component represented by the formula (A) and at least one polymer segment without an ion conductive component represented by the formulae (B-1), (B-3) and the like and containing an aromatic ring bonded at the meta-positions or ortho-positions: wherein X is a single bond, &#x2014;CO&#x2014;, &#x2014;SO&#x2014; or the like; W is a single bond, &#x2014;CO&#x2014;, &#x2014;SO&#x2014; or the like; Q is a single bond, &#x2014;O&#x2014;, &#x2014;S&#x2014; or the like; J is a single bond, &#x2014;CO&#x2014;, &#x2014;SO&#x2014; or the like; and Rto Rare each a hydrogen atom, a fluorine atom, an alkyl group or the like.

Sulfonic group-containing polyarylene block copolymer, process for production thereof, solid polymer electrolyte and proton conductive membrane

Disclosed is an aromatic sulfonic acid ester derivative represented by the formula (1); in the formula, X is an atom or a group selected from a halogen atom excluding fluorine, &#x2014;OSOCHand &#x2014;OSOCF, A is a divalent electron attractive group, B is a divalent electron donating group or a direct bonding, Ris a hydrocarbon group of 1 to 20 carbon atoms, Ar is an aromatic group having a substituent of &#x2014;SOR(wherein Ris a hydrocarbon group of 1 to 20 carbon atoms), m is an integer of 0 to 10, n is an integer of 0 to 10 and k is an integer of 1 to 4. Also disclosed is a process for producing a polyarylene having a sulfonic acid group, which process comprises the steps of coupling polymerization of an aromatic compound containing the derivative of the formula (1), to prepare a polyarylene and hydrolysis of the polyarylene, and which process has high safety and is easily capable of controlling the amount of sulfonoc acid group introduced into a polymer and the introducing position thereof.

Aromatic sulfonic acid ester derivative, polyarylene, polyarylene having sulfonic acid group and process for producing the same, and polymer solid electrolyte and proton-conductive membrane

Growing community of inventors

Tokyo, Japan

Yousuke Konno